Dr. Xian-Zi Dong Profile

Dr. Xian-Zi Dong

at Technical Institute of Physics and Chemistry

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 6 February 2019 Paper

Multi-photon laser lithography of AR-N 4340 photoresist with a spatial resolution at nanoscale

Hong-Zhong Cao, Xian-Zi Dong, Feng Jin, Mei-Ling Zheng, Zhen-Sheng Zhao, Xuan-Ming Duan

Proceedings Volume 10842, 108420G (2019) https://doi.org/10.1117/12.2506365

KEYWORDS: Photoresist materials, Spatial resolution, Lithography, Multiphoton lithography, Nanolithography, Laser applications

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Proceedings Article | 6 February 2019 Paper

Three-dimensional micro-cones fabricated via two-photon photolithography

Yu-Huan Liu, Xian-Zi Dong, Yuan-Yuan Zhao, Mei-Ling Zheng, Feng Jin, Jie Liu, Xuan-Ming Duan, Zhen-Sheng Zhao

Proceedings Volume 10842, 108420E (2019) https://doi.org/10.1117/12.2506108

KEYWORDS: Optical lithography, Scanning electron microscopy, Objectives, Photoresist materials, Polymers, Process control, Two photon polymerization, Biomimetics, Polymerization, Spatial resolution

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Proceedings Article | 6 February 2019 Paper

Biocompatible three-dimensional hydrogel microstructures fabricated by two-photon polymerization

Hong Yu, Mei-Ling Zheng, Jie Liu, Yuan-Yuan Zhao, Feng Jin, Xian-Zi Dong

Proceedings Volume 10842, 108420C (2019) https://doi.org/10.1117/12.2506104

KEYWORDS: Scanning electron microscopy, Two photon polymerization, Tissue engineering, Laser scanners, Tissues, Biomedical optics

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Proceedings Article | 6 February 2019 Paper

Additive manufacturing of millimeter-scale micron-accuracy 3D structures

Hua Yang, Yuan-Yuan Zhao, Feng Jin, Jie Liu, Xian-Zi Dong, Mei-Ling Zheng, Xuan-Ming Duan, Zhen-Sheng Zhao

Proceedings Volume 10842, 108420B (2019) https://doi.org/10.1117/12.2506103

KEYWORDS: 3D printing, Printing, Two photon polymerization, 3D modeling, Photoresist materials, Additive manufacturing, Manufacturing, Polymers, Scanning electron microscopy, Surface roughness

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Proceedings Article | 19 October 2016 Paper

Variable angle transmittance of silver grid transparent electrodes

Yuan-Yuan Zhao, Mei-Ling Zheng, Xian-Zi Dong, Zhen-Sheng Zhao, Xuan-Ming Duan

Proceedings Volume 10155, 101553O (2016) https://doi.org/10.1117/12.2247430

KEYWORDS: Transmittance, Silver, Electrodes, Resistance

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Proceedings Article | 15 October 2015 Paper

Fabrication and optical transmission characteristics of polymers woodpile photonic crystal structures with different crystal planes

Ling-Jing Chen, Xian-Zi Dong, Yuan-Yuan Zhao, Yong-Liang Zhang, Jie Liu, Mei-Ling Zheng, Xuan-Ming Duan, Zhen-Sheng Zhao

Proceedings Volume 9671, 967127 (2015) https://doi.org/10.1117/12.2203191

KEYWORDS: Crystals, Photonic crystals, Polymers, Transmittance, FT-IR spectroscopy, Photonic crystal devices, Scanning electron microscopy, Reflection, Refraction, Laser applications

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Proceedings Article | 15 October 2015 Paper

The effect of radial polarization in multiphoton lithography

Le Lin, Mei-Ling Zheng, Xian-Zi Dong, Xuan-Ming Duan, Zhen-Sheng Zhao

Proceedings Volume 9671, 967126 (2015) https://doi.org/10.1117/12.2203153

KEYWORDS: Polymers, Polarization, Multiphoton lithography, Scanning electron microscopy, Neodymium, Photoresist materials, Objectives, Glasses, Laser applications, Statistical analysis

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Proceedings Article | 11 October 2012 Paper

Photoisomerization of azobenzene moiety in crosslinking polymer materials

Hui Wang, Wei-Qiang Chen, Feng Jin, Xian-Zi Dong, Zhen-Sheng Zhao, Xuan-Ming Duan

Proceedings Volume 8474, 847414 (2012) https://doi.org/10.1117/12.929146

KEYWORDS: Polymers, Absorbance, Chromophores, Polymer thin films, Absorption, Nd:YAG lasers, Physics, Doping, Chemical analysis, Polymerization

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SPIE Journal Paper | 14 May 2012

Femtosecond laser lithography technique for submicron T-gate fabrication on positive photoresist

Yan-Dong Du, Wei-Hua Han, Wei Yan, Xiao-Na Xu, Yan-Bo Zhang, Xiao-dong Wang, Fu-Hua Yang, Hong-Zhong Cao, Feng Jin, Xian-Zi Dong, Zhen-Sheng Zhao, Xuan-Ming Duan, Yang Liu

OE, Vol. 51, Issue 5, 054303, (May 2012) https://doi.org/10.1117/12.10.1117/1.OE.51.5.054303

KEYWORDS: Femtosecond phenomena, Lithography, Photoresist materials, Silicon, Sapphire, Submicron lithography, Gallium nitride, Fabrication, Head, Absorption

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Showing 5 of 9 publications

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