Mr. Yang Lu Profile

Yang Lu

at Micron Technology Inc

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Author

Publications (2)

SPIE Journal Paper | 6 February 2024

Make the impossible possible: use variable-shaped beam mask writers and curvilinear full-chip inverse lithography technology for 193i contacts/vias with mask-wafer co-optimization

Linyong (Leo) Pang, Sha Lu, Ezequiel Vidal Russell, Yang Lu, Michael Lee, Jennefir Digaum, Ming-Chuan Yang, P. Jeffrey Ungar, Michael Pomerantsev, Mariusz Niewczas, Kechang Wang, Bo Su, Michael Meyer, Aki Fujimura

JM3, Vol. 23, Issue 01, 011207, (February 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011207

KEYWORDS: Vestigial sideband modulation, Semiconducting wafers, Optical proximity correction, SRAF, Critical dimension metrology, Lithography, Printing, Design, Scanning electron microscopy, Photomask technology

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Proceedings Article | 7 October 2020 Presentation + Paper

Enabling faster VSB writing of 193i curvilinear ILT masks that improve wafer process windows for advanced memory applications

Linyong (Leo) Pang, Ezequiel Russell, Bill Baggenstoss, Yang Lu, Michael Lee, Jennefir Digaum, Ming-Chuan Yang, Ryan Pearman, P. Jeffrey Ungar, Lu Sha, Ali Bouaricha, Michael Pomerantsev, Mariusz Niewczas, Kechang Wang, Bo Su, Michael Meyer, Aki Fujimura

Proceedings Volume 11518, 115180W (2020) https://doi.org/10.1117/12.2579729

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