Dr. Yuichi Yoshida
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 8 April 2019 Paper
Proceedings Volume 10960, 109600A (2019) https://doi.org/10.1117/12.2515187
KEYWORDS: Stochastic processes, Calibration, Extreme ultraviolet, Line edge roughness, 3D modeling, Extreme ultraviolet lithography, Switching

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10957, 109571O (2019) https://doi.org/10.1117/12.2515183
KEYWORDS: Modeling and simulation, Calibration, Ultraviolet radiation, Extreme ultraviolet lithography, Stochastic processes, Data modeling, Line width roughness, Extreme ultraviolet, Scanning electron microscopy

Proceedings Article | 20 March 2012 Paper
Keiichi Tanaka, Tomohiro Iseki, Hiroshi Marumoto, Koji Takayanagi, Yuichi Yoshida, Ryouichi Uemura, Kosuke Yoshihara
Proceedings Volume 8325, 83252L (2012) https://doi.org/10.1117/12.915813
KEYWORDS: Semiconducting wafers, Particles, Photoresist processing, Bridges, Wafer manufacturing, Polymers, Capillaries, Yield improvement, NOx, Optical lithography

Proceedings Article | 1 April 2009 Paper
Hiroshi Arima, Yuichi Yoshida, Kosuke Yoshihara, Tsuyoshi Shibata, Yuki Kushida, Hiroki Nakagawa, Yukio Nishimura, Yoshikazu Yamaguchi
Proceedings Volume 7273, 727333 (2009) https://doi.org/10.1117/12.814034
KEYWORDS: Polymers, Photoresist processing, Image processing, Materials processing, Semiconducting wafers, Photoresist developing, Lithography, Photomasks, Dynamic light scattering, Photoresist materials

Proceedings Article | 1 April 2009 Paper
Takehiko Naruoka, Nobuji Matsumura, Akimasa Soyano, Shiro Kusumoto, Yoshikazu Yamaguchi, Hiroshi Arima, Yuichi Yoshida, Kousuke Yoshihara, Tsuyoshi Shibata
Proceedings Volume 7273, 727328 (2009) https://doi.org/10.1117/12.814084
KEYWORDS: Surface properties, Water, Immersion lithography, Lithography, Photoresist processing, Thin film coatings, Semiconducting wafers, Defect inspection, Coating, Line width roughness

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63492C (2006) https://doi.org/10.1117/12.692886
KEYWORDS: Photomasks, Quartz, Nanoimprint lithography, Manufacturing, Semiconducting wafers, Inspection, Etching, Photoresist processing, Vestigial sideband modulation, Electron beams

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 62833G (2006) https://doi.org/10.1117/12.681835
KEYWORDS: Quartz, Etching, Line edge roughness, Photomasks, Vestigial sideband modulation, Nanoimprint lithography, Lithography, Photoresist processing, Beam shaping, Scanning electron microscopy

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 62831Y (2006) https://doi.org/10.1117/12.681762
KEYWORDS: Semiconducting wafers, Photomasks, Signal attenuation, Critical dimension metrology, Binary data, Ultrafast phenomena, Laser applications, Laser scattering, Quartz, Scattering

Proceedings Article | 6 December 2004 Paper
Yasutaka Morikawa, Kouichirou Kojima, Hiroyuki Hashimoto, Yuuichi Yoshida, Shiho Sasaki, Hiroshi Mohri, Naoya Hayashi
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569186
KEYWORDS: Inspection, Photomasks, Defect detection, Printing, Quartz, Resolution enhancement technologies, Defect inspection, Neodymium, Lithography, Manufacturing

Proceedings Article | 20 August 2004 Paper
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557765
KEYWORDS: Photomasks, Atomic force microscopy, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, 3D metrology, Atomic force microscope, Metrology, Printing, Wafer-level optics

Proceedings Article | 28 August 2003 Paper
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504065
KEYWORDS: Etching, Photomasks, Dry etching, Atomic force microscopy, Phase shifts, Atomic force microscope, Printing, Quartz, Semiconducting wafers, Chromium

Showing 5 of 11 publications
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