PROLITH: A Comprehensive Optical Lithography Model

Chris A. Mack

doi:10.1117/12.947767

23 July 1985 PROLITH: A Comprehensive Optical Lithography Model

Chris A. Mack

Proceedings Volume 0538, Optical Microlithography IV; (1985) https://doi.org/10.1117/12.947767
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

The Positive Resist Optical Lithography model (PROLITH) is introduced. The model predicts resist profiles for submicron projection, proximity and contact printing. Included are models for optical projection systems, the standing wave effect for projection printing, a diffraction model for contact printing, a kinetic model for the exposure reaction, and a kinetic model of the development process. Also included in PROLITH are the effects of prebake conditions and polychromatic exposure.

Citation Download Citation

Chris A. Mack "PROLITH: A Comprehensive Optical Lithography Model", Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); https://doi.org/10.1117/12.947767

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