Growth mechanism of orientated PLZT thin films sputtered on glass substrate

Rui Tao Zhang; Ming Ge; Weigen Luo

doi:10.1117/12.47227

1 November 1991 Growth mechanism of orientated PLZT thin films sputtered on glass substrate

Rui Tao Zhang, Ming Ge, Weigen Luo

Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47227
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China

Abstract

Closely packed polycrystalline transparent PLZT(28/0/100) thin films with excellent crystal orientation have been successfully prepared on glass substrate by rf planar magnetron sputtering using powder target. The preferred orientation of PLZT(28/0/100) thin film is (100). Its growth mechanism can be described by Volmer-Weber Mechanism. At the incipience of sputtering, preferred orientated PLZT small islands are formed on glass. Then through the coalescence of these islands and recrystallization process, the polycrystalline orientated PLZT thin film is formed. In proper sputtering conditions, PLZT thin films with single orientation can be prepared.

Citation Download Citation

Rui Tao Zhang, Ming Ge, and Weigen Luo "Growth mechanism of orientated PLZT thin films sputtered on glass substrate", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47227

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