Preparation of PbTiO3 thin film by dc single-target magnetron sputtering

Bangchao Yang; Ju Yong Wang; Yu Ming Jia; Yongjie Huang

doi:10.1117/12.47277

1 November 1991 Preparation of PbTiO₃ thin film by dc single-target magnetron sputtering

Bangchao Yang, Ju Yong Wang, Yu Ming Jia, Yongjie Huang

Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47277
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China

Abstract

This paper describes the preparation of PbTiO₃ thin film by DC single-target magnetron reactive sputtering, which hasn't yet been reported. After many experiments, the best Pb/Te area ratio of the target has been found under a specified sputtering condition. The samples obtained are heat-treated to 600 degree(s)C and the x-ray diffraction patterns are observed. The authors have succeeded in preparing almost transparent and light yellow perovskite-type PbTiO₃ with resistivity of 10⁷(Omega) cm.

Citation Download Citation

Bangchao Yang, Ju Yong Wang, Yu Ming Jia, and Yongjie Huang "Preparation of PbTiO₃ thin film by dc single-target magnetron sputtering", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47277

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