Paper
7 July 1997 Basic challenges of optical overlay measurements
Anatoly Shchemelinin, Eugene Shifrin, Alexander I. Zaslavsky
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Abstract
The basic challenges of optical overlay measurements are discussed. It is shown that overlay measurement precision is determined by optical resolution, signal to noise ratio of the measurement system and properties of the overlay target. Some tips for better overlay target design ad hardware improvement are formulated. It is shown that an interferometer based measurement system allows better accuracy than the brightfield one. It is shown that for current measurement techniques, 130 nm design rule requirements can be met.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anatoly Shchemelinin, Eugene Shifrin, and Alexander I. Zaslavsky "Basic challenges of optical overlay measurements", Proc. SPIE 3050, Metrology, Inspection, and Process Control for Microlithography XI, (7 July 1997); https://doi.org/10.1117/12.275929
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Overlay metrology

Edge detection

Correlation function

Diffraction

Interference (communication)

Imaging systems

Optical resolution

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