Improved wafer stepper alignment performance using an enhanced phase grating alignment system

Jaap H. M. Neijzen; Robert D. Morton; Peter Dirksen; Henry J. L. Megens; Frank Bornebroek

doi:10.1117/12.350826

14 June 1999 Improved wafer stepper alignment performance using an enhanced phase grating alignment system

Jaap H. M. Neijzen, Robert D. Morton, Peter Dirksen, Henry J. L. Megens, Frank Bornebroek

Proceedings Volume 3677, Metrology, Inspection, and Process Control for Microlithography XIII; (1999) https://doi.org/10.1117/12.350826
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Processes such as chemical mechanical polishing and spin coating can result in the asymmetric deformation of alignment marks. In this paper, the effects of such asymmetric mark deformations on the accuracy of the stepper alignment system are investigate. An advanced phase grating alignment system is presented which is more robust against the above mentioned process-induced alignment deviations. The potential of the new alignment system will be illustrated with result of both numerical simulations and experimental measurements. Various process modules that are known to cause mark deformations have been investigated.

Citation Download Citation

Jaap H. M. Neijzen, Robert D. Morton, Peter Dirksen, Henry J. L. Megens, and Frank Bornebroek "Improved wafer stepper alignment performance using an enhanced phase grating alignment system", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); https://doi.org/10.1117/12.350826

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