Micro/nano moire methods

Anand Krishna Asundi; Haixia Shang; Huimin Xie; Biao Li

doi:10.1117/12.500902

3 October 2003 Micro/nano moire methods

Anand Krishna Asundi, Haixia Shang, Huimin Xie, Biao Li

Proceedings Volume 5145, Microsystems Engineering: Metrology and Inspection III; (2003) https://doi.org/10.1117/12.500902
Event: Optical Metrology, 2003, Munich, Germany

Abstract

Two novel micro/nano moire method, SEM scanning moiré and AFM scanning moire techniques are discussed in this paper. The principle and applications of two scanning moire methods are described in detail. The residual deformation in a polysilicon MEMS cantilever structure with a 5000 lines/mm grating after removing the SiO₂ sacrificial layer is accurately measured by SEM scanning moire method. While AFM scanning moire method is used to detect thermal deformation of electronic package components, and formation of nano-moire on a freshly cleaved mica crystal. Experimental results demonstrate the feasibility of these two moire methods, and also show they are effective methods to measure the deformation from micron to nano-scales.

Citation Download Citation

Anand Krishna Asundi, Haixia Shang, Huimin Xie, and Biao Li "Micro/nano moire methods", Proc. SPIE 5145, Microsystems Engineering: Metrology and Inspection III, (3 October 2003); https://doi.org/10.1117/12.500902

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