Alignment for double-side deep-exposure lithography tool

Ping Ma; Xiaofang Fu; Chunli Yang; Song Hu; Xiaoping Tang

doi:10.1117/12.867698

22 October 2010 Alignment for double-side deep-exposure lithography tool

Ping Ma, Xiaofang Fu, Chunli Yang, Song Hu, Xiaoping Tang

Proceedings Volume 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 76571W (2010) https://doi.org/10.1117/12.867698
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China

Abstract

The paper presents and discusses several prevalent methods for lithography alignment, and then describes and emphasizes the principle, mechanical structure and alignment procedure of the bottom-side alignment (BSA) system for deep-exposure lithography tool. Also, the error source degrading the precision of the alignment system is analyzed. Other related techniques and methods are provided. In the end, the aligned reticle image shows that the system is proved to be stable, reliable and capable of meeting the required precision when it is applied to DUV double-side deep-exposure mask aligner.

Citation Download Citation

Ping Ma, Xiaofang Fu, Chunli Yang, Song Hu, and Xiaoping Tang "Alignment for double-side deep-exposure lithography tool", Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 76571W (22 October 2010); https://doi.org/10.1117/12.867698

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