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9 March 2022 Nano-sized column integrated structure through silicon oxide pattern process
Je Won Kim
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Proceedings Volume PC12022, Light-Emitting Devices, Materials, and Applications XXVI; PC120220X (2022) https://doi.org/10.1117/12.2608719
Event: SPIE OPTO, 2022, San Francisco, California, United States
Abstract
In a light emitting diode-based semiconductor light source that is variously applied as a display light source, luminous efficiency is a very important optical property, and various research methods including multiple quantum wells have been proposed to increase the luminous efficiency. However, since the efficiency improvement is basically based on the planar structure, there was a limit to the improvement of optical properties. In this study, nano holes were formed through micro patterns and etching of silicon oxide, different from the conventional structure are proposed. In addition, it is possible to implement a nano sized columnar structure through nano holes of silicon oxide, and by depositing a light emitting layer on the nano structure, it is intended to present a semiconductor light source having a nano-sized light emitting structure.
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Je Won Kim "Nano-sized column integrated structure through silicon oxide pattern process", Proc. SPIE PC12022, Light-Emitting Devices, Materials, and Applications XXVI, PC120220X (9 March 2022); https://doi.org/10.1117/12.2608719
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KEYWORDS
Oxides
Silicon
Nanolithography
Etching
Nano light sources
Light sources
Light sources and illumination
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