The process-footprint and density-dependent errors correction of laser mask pattern generator with software-based data path for cd uniformity improvement

Hsiang Jen Yang; Po-Sheng Wang; Yen-Hao Chen; Sheng-Hsin Sun; Ting-Ching Hu; Chia-Wei Lin; Lance Lin

doi:10.1117/12.2687188

22 November 2023 The process-footprint and density-dependent errors correction of laser mask pattern generator with software-based data path for cd uniformity improvement

Hsiang Jen Yang, Po-Sheng Wang, Yen-Hao Chen, Sheng-Hsin Sun, Ting-Ching Hu, Chia-Wei Lin, Lance Lin

Author Affiliations +

Proceedings Volume PC12751, Photomask Technology 2023; PC127510X (2023) https://doi.org/10.1117/12.2687188
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Conference Poster

Abstract

ALTA 4700DP, a new design laser mask pattern generator (LMPGs), is constructed with multi-core CPU server. Different from the traditional hardware-based data path LMPGs, the integrated software features of ALTA 4700DP provide the compensation function for critical dimension (CD) variation which caused from the post-exposure processing of the plate. The process includes the post-exposure bake, the developing of the photoresist, and the etching of the chrome. Through the correction of the density-dependent errors and process-footprint errors, the global CD uniformity can be improved.

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Hsiang Jen Yang, Po-Sheng Wang, Yen-Hao Chen, Sheng-Hsin Sun, Ting-Ching Hu, Chia-Wei Lin, and Lance Lin "The process-footprint and density-dependent errors correction of laser mask pattern generator with software-based data path for cd uniformity improvement", Proc. SPIE PC12751, Photomask Technology 2023, PC127510X (22 November 2023); https://doi.org/10.1117/12.2687188

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