Ion Chromatography has already shown its value as a process monitoring and troubleshooting tool for the semiconductor and disk drive manufacturers. Similarly, there are many possible uses for this analytical technique in the manufacture of microelectromechanical devices. Some of these uses are: (i) the analysis of corrosive ions in ultrapure water and ultrapure chemicals; (ii) analysis of plating bath constituents and contaminants; (iii) analysis of corrosive ions found on MEMS devices during manufacturing and which can later cause device failure of reliability problems; (iv) the analysis of corrosive ions found on MEMS manufacturing tools, carriers and other materials that come in contact with the final product. This paper will explore the many uses of ion chromatography for the manufacture of MEMS devices. Special techniques, only recently developed for use on very small objects, will also be presented for the analysis of ions at part per trillion levels.
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