Dr. Istvan Mohacsi Profile

Dr. Istvan Mohacsi

Postdoctoral Research Associate at Deutsches Elektronen-Synchrotron

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Publications (9)

Proceedings Article | 3 October 2017 Presentation

Double-sided Fresnel zone plates for high-efficiency x-ray nanofocusing (Conference Presentation)

Istvan Mohacsi, Ismo Vartiainen, Manuel Guizar-Sicairos, Vitaliy Guzenko, Ian McNulty, Robert Winarski, Martin Holt, Elisabeth Mueller, Andrea Somogyi, Christian David

Proceedings Volume 10389, 1038907 (2017) https://doi.org/10.1117/12.2273960

KEYWORDS: Zone plates, X-ray optics, Near field optics, X-rays, Diffraction, Lenses, Collimation, Optical components, Near field, Optical lithography

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SPIE Journal Paper | 27 July 2017

RESCAN: an actinic lensless microscope for defect inspection of EUV reticles

Iacopo Mochi, Patrick Helfenstein, Istvan Mohacsi, Rajeev Rajendran, Dimitrios Kazazis, Shusuke Yoshitake, Yasin Ekinci

JM3, Vol. 16, Issue 04, 041003, (July 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041003

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Proceedings Article | 28 March 2017 Presentation + Paper

Towards a stand-alone high-throughput EUV actinic photomask inspection tool: RESCAN

Rajeev Rajendran, Iacopo Mochi, Patrick Helfenstein, Istvan Mohacsi, Sophie Redford, Aldo Mozzanica, Bernd Schmitt, Shushuke Yoshitake, Yasin Ekinci

Proceedings Volume 10145, 101450N (2017) https://doi.org/10.1117/12.2258379

KEYWORDS: Extreme ultraviolet, Photomasks, Metrology, Sensors, Inspection, Extreme ultraviolet lithography, Reticles, Lithography, Scanners, High volume manufacturing, Diffraction, Photons, Scattering, Image restoration, Defect detection, Prototyping

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Proceedings Article | 24 March 2017 Paper

RESCAN: an actinic lensless microscope for defect inspection of EUV reticles

Iacopo Mochi, Patrick Helfenstein, Istvan Mohacsi, Rajeev Rajendran, Shusuke Yoshitake, Yasin Ekinci

Proceedings Volume 10143, 101431O (2017) https://doi.org/10.1117/12.2258086

KEYWORDS: Photomasks, Defect inspection, Extreme ultraviolet, Reticles, Microscopes, Inspection, Image resolution, Imaging systems, Scattering, Diffraction, Sensors, Defect detection, Prototyping

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Proceedings Article | 5 October 2016 Paper

Scanning coherent scattering methods for actinic EUV mask inspection

Y. Ekinci, P. Helfenstein, R. Rajeev, I. Mochi, I. Mohacsi, J. Gobrecht, S. Yoshitake

Proceedings Volume 9985, 99851P (2016) https://doi.org/10.1117/12.2242961

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Diffraction, Scattering, Light scattering, Microscopy, Sensors, Metrology, Signal to noise ratio

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SPIE Journal Paper | 16 September 2016 Open Access

Scanning coherent diffractive imaging methods for actinic extreme ultraviolet mask metrology

Patrick Helfenstein, Istvan Mohacsi, Rajendran Rajeev, Yasin Ekinci

JM3, Vol. 15, Issue 03, 034006, (September 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.034006

KEYWORDS: Extreme ultraviolet, Photomasks, Coherence imaging, Sensors, Metrology, Diffraction, Reconstruction algorithms, Image resolution, Microscopy, Detection and tracking algorithms

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Proceedings Article | 24 March 2016 Paper

Scanning scattering contrast microscopy for actinic EUV mask inspection

I. Mohacsi, P. Helfenstein, R. Rajendran, Y. Ekinci

Proceedings Volume 9778, 97781O (2016) https://doi.org/10.1117/12.2220027

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Metrology, Extreme ultraviolet lithography, Diffraction, Scattering, Microscopy, Lithography, Light scattering, Laser scattering

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Proceedings Article | 18 March 2016 Paper

Scanning coherent diffractive imaging methods for actinic EUV mask metrology

Patrick Helfenstein, Istvan Mohacsi, Rajeev Rajendran, Yasin Ekinci

Proceedings Volume 9776, 97761F (2016) https://doi.org/10.1117/12.2219937

KEYWORDS: Photomasks, Extreme ultraviolet, Coherence imaging, Metrology, Sensors, Inspection, Nanotechnology, Extreme ultraviolet lithography, Lithography, Defect detection, Diffraction, Reconstruction algorithms, Image resolution, Detection and tracking algorithms

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Proceedings Article | 26 September 2013 Paper

High efficiency x-ray nanofocusing by the blazed stacking of binary zone plates

I. Mohacsi, P. Karvinen, I. Vartiainen, A. Diaz, A. Somogyi, C. Kewish, P. Mercere, C. David

Proceedings Volume 8851, 88510Z (2013) https://doi.org/10.1117/12.2022640

KEYWORDS: Zone plates, Diffraction, Binary data, Optical alignment, Phase shifts, X-rays, Lenses, Scanning electron microscopy, Near field optics, Actuators

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Showing 5 of 9 publications

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