Dr. Navab Singh Profile

Dr. Navab Singh

Member of Technical Staff at Institute of Microelectronics

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 13 March 2024 Presentation + Paper

Low-loss 800nm-thick PECVD silicon nitride photonic platform on 300-mm wafer

Hong Cai, Bo Li, Yiding Lin, Haitao Yu, Steven Hou Jang Lee, Chin Khang Tew, Jae Ok Yoo, Charmaine Goh, Shervonne Woon, Doris Keh Ting Ng, Navab Singh, Xianshu Luo, Lennon Yao Ting Lee

Proceedings Volume 12898, 1289802 (2024) https://doi.org/10.1117/12.3002146

KEYWORDS: Silicon nitride, Waveguides, Semiconducting wafers, Plasma enhanced chemical vapor deposition, Silicon photonics, Film thickness, Fabrication, Chemical mechanical planarization, Photonic integrated circuits

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Proceedings Article | 15 March 2023 Presentation + Paper

Model-based optical proximity correction for immersion lithography-based flat optics platform

Narak Choi, Keng Heng Lai, Arvind Sundaram, Navab Singh, Yuan Hsing Fu, Lennon Y. T. Lee

Proceedings Volume 12432, 1243205 (2023) https://doi.org/10.1117/12.2647686

KEYWORDS: Optical proximity correction, Flat optics, Critical dimension metrology, Optical lithography, Manufacturing, Lithography, Design and modelling

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Proceedings Article | 5 March 2021 Presentation + Paper

CMOS compatible MEMS pyroelectric infrared detectors: from AlN to ScAlN

Doris K. Ng, Chong-Pei Ho, Tantan Zhang, Linfang Xu, Li-Yan Siow, Wing-Wai Chung, Hong Cai, Lennon Y. Lee, Qingxin Zhang, Navab Singh

Proceedings Volume 11697, 116970N (2021) https://doi.org/10.1117/12.2582707

KEYWORDS: Infrared sensors, Infrared radiation, Absorption, Thin films, Sensors, Pyroelectric detectors, Infrared detectors, Aluminum nitride, Microelectromechanical systems, Thermography

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Proceedings Article | 4 March 2015 Paper

MEMS switchable infrared metamaterial absorber

Prakash Pitchappa, Chong Pei Ho, You Qian, Yu Sheng Lin, Navab Singh, Chengkuo Lee

Proceedings Volume 9302, 93021I (2015) https://doi.org/10.1117/12.2081135

KEYWORDS: Metamaterials, Absorption, Molybdenum, Microelectromechanical systems, Silica, Infrared radiation, Electro optics, Dielectric polarization, Reflectors, Switching

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SPIE Journal Paper | 1 April 2005

Intensity imbalance in phase shift masks and correction by multiple exposures

Moitreyee Mukherjee-Roy, Navab Singh, Sohan Mehta, Yasuki Kimura, Hideki Suda, Kazunori Nagai

JM3, Vol. 4, Issue 02, 023004, (April 2005) https://doi.org/10.1117/12.10.1117/1.1898043

KEYWORDS: Photomasks, Phase shifts, Monochromatic aberrations, Reticles, Diffraction, Critical dimension metrology, Cadmium, Scattering, Optical lithography, Semiconducting wafers

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Proceedings Article | 28 May 2004 Paper

Key challenges in across-pitch 0.33-k1 trench patterning using hybrid mask

Navab Singh, Moitreyee Mukherjee-Roy, Sohan Mehta, Hideki Suda, Takao Kubota, Yasuki Kimura, Hiroshi Kinoshita

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.547729

KEYWORDS: Photomasks, Optical lithography, Etching, Modulation, Phase shifts, Lithography, Binary data, Scanners, Manufacturing, Scanning electron microscopy

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Proceedings Article | 24 May 2004 Paper

Alignment in chromeless masks

Moitreyee Mukherjee-Roy, Navab Singh, Sohan Mehta, Hideki Suda, Takao Kubota, Yasuki Kimura, Hiroshi Kinoshita

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.538224

KEYWORDS: Scanning electron microscopy, Overlay metrology, Monochromatic aberrations, Optical lithography, Reticles, Photomasks, Etching, Mask making, Phase shifts, Structural design

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Proceedings Article | 3 May 2004 Paper

Patterning sub-50-nm Fin-FET using KrF lithography tool

Navab Singh, S. Jagar, Sohan Mehta, Moitreyee Mukherjee Roy, Rakesh Kumar, N. Balasubramanian

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.536040

KEYWORDS: Directed energy weapons, Optical lithography, Photomasks, Lithography, Field effect transistors, Semiconducting wafers, Electron beam lithography, Reticles, Scanning electron microscopy, Scanners

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Proceedings Article | 26 June 2003 Paper

Impact of scattering bars in damascene trench patterning

Sohan Mehta, Navab Singh, Moitreyee Mukherjee-Roy, Rakesh Kumar

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485377

KEYWORDS: Scattering, Critical dimension metrology, Binary data, Optical lithography, Photomasks, Reticles, Semiconducting wafers, Phase shifts, Modulation, Diffraction

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Proceedings Article | 2 June 2003 Paper

Evaluation of alignment target designs for Cu and low-K dual damascene processes

Moitreyee Mukherjee-Roy, Navab Singh, Sohan Mehta, Wai Chik, Chin Tiong Sim, Francis Cheong

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.482800

KEYWORDS: Optical alignment, Semiconducting wafers, Thin film coatings, Dielectrics, Signal processing, Photomasks, Overlay metrology, Sensors, Copper, Etching

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Proceedings Article | 30 July 2002 Paper

Effect of feature size, pitch, and resist sensitivity on side-lobe and ring formation for via hole patterning in attenuated phase-shift masks

Navab Singh, Moitreyee Mukherjee-Roy

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474484

KEYWORDS: Photomasks, Nanoimprint lithography, Optical lithography, Printing, Phase shifts, Diffraction, Scanning electron microscopy, Reticles, Lithography, Resolution enhancement technologies

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Showing 5 of 11 publications

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