Dr. Qiaowei Lou
at TEL Technology Ctr America LLC
SPIE Involvement:
Author
Publications (3)

SPIE Journal Paper | 17 June 2021
Eric Liu, Katie Lutker-Lee, Qiaowei Lou, Ya-Ming Chen, Angélique Raley, Peter Biolsi, Kai-Hung Yu, Gregory Denbeaux
JM3, Vol. 20, Issue 02, 024901, (June 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.2.024901
KEYWORDS: Line edge roughness, System on a chip, Extreme ultraviolet, Plasma, Etching, Lithography, Silicon, Double patterning technology, Line width roughness, Extreme ultraviolet lithography

Proceedings Article | 9 April 2021 Presentation + Paper
Eric Liu, Katie Lutker-Lee, Qiaowei Lou, Ya-Ming Chen, Angélique Raley, Peter Biolsi
Proceedings Volume 11615, 1161506 (2021) https://doi.org/10.1117/12.2582556

Proceedings Article | 6 April 2020 Presentation + Paper
Proceedings Volume 11323, 113230V (2020) https://doi.org/10.1117/12.2551727
KEYWORDS: Line edge roughness, Lithography, Etching, Amorphous silicon, Extreme ultraviolet, Oxidation, Extreme ultraviolet lithography, Optical lithography, Scanning electron microscopy, Critical dimension metrology

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