So-Won Yoon
at Hongik Univ
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10957, 109571N (2019) https://doi.org/10.1117/12.2515224
KEYWORDS: Line edge roughness, Fin field effect transistors, Extreme ultraviolet lithography, Oxides, Stochastic processes, Critical dimension metrology, Lithography, Semiconductors, Doping, Bismuth

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top