Mr. Toshihiko Fujimoto Profile

Toshihiko Fujimoto

at Osaka City Univ

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Proceedings Article | 13 February 2008 Paper

Titanium oxide/nickel oxide multilayer mirror for attosecond soft x rays

Y. Masuda, T. Fujimoto, H. Kumagai, A. Kobayashi

Proceedings Volume 6890, 68900T (2008) https://doi.org/10.1117/12.762530

KEYWORDS: Mirrors, Reflectivity, Oxides, Multilayers, Titanium, X-rays, Reflection, Focus stacking software, Interfaces, Absorption

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A novel TiO/NiO multilayer mirror based on an atomic layer epitaxy (ALE) technique has been designed to realize a high reflective mirror and an attosecond chirped mirror in soft x-rays "water-window" wavelengths region. The layer thickness should be controlled on an atomic scale, but in ALE, according to a self-limiting mechanism which is found in the fabrication of oxide thin films, the epitaxial growth is automatically stopped at strictly 1 monolayer (ML) in one alternative precursor dosing. An oxide multilayer is also expected to overcome serious problems such as scattering loss at interfaces of the multilayer. TiO and NiO are an exquisite combination which has the potential to make their superlattice on a MgO substrate because each oxide has the NaCl structure of nearly equal lattice constant (TiO = 0.41766 nm, NiO = 0.41684 nm, MgO = 0.42112 nm). The theoretical calculation of a periodic multilayer mirror showed the high reflectivity of over 50% at a wavelength of 2.73 nm and the incident angle of 18.9° from the normal incidence. Additionary, reflective properties of ultrashort pulses induced to design a chirped structure stacked by blocks of several multi-periodic structures, which must have a spectral bandwidth and a controlled phase to compress a temporal broadening of the pulses down to a few hundreds of attoseconds. In this paper, we report the details of structures between titanium oxide and nickel oxide, and properties both as a high reflection mirror and as a chirped mirror.

Proceedings Article | 13 March 2007 Paper

Atomic layer deposition of atomic mirror for silicon

T. Fujimoto, Y. Shiomi, H. Kumagai, A. Kobayashi

Proceedings Volume 6458, 64581D (2007) https://doi.org/10.1117/12.699991

KEYWORDS: Mirrors, Refractive index, Atomic layer deposition, Thin films, Silicon, Chemical species, Aluminum, Absorption, Interfaces, Gases

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There have been significant progresses in atom optics utilizing laser cooling techniques in recent years. Among them, we have been interested in an atomic mirror for silicon which can reflect silicon atoms. The atomic mirror consists of two layers on a sapphire substrate, and then atoms are reflected by the dipole forces from evanescent waves caused by the light reflected internally and totally at the interface of different refractive indices. In this study, we have constructed some structures of the atomic mirror. We tried atomic layer deposition techniques for preparation of both Al₂O₃ and TiO₂ thin films, whose surface and interface roughnesses are well suppressed. In order to achieve the predicted enhancement of the evanescent waves, atomic layer deposition of the layer with the higher refractive index is especially important. It has found that absorption can be suppressed considerably by adding Al(CH₃)₃ precursor gas to the alternate introducing cycle of TiCl₄ and H₂O₂ precursor gases. We use this effect which can improve homogeneity and flatness of layers significantly, to design an atomic mirror using atomic layer deposition.

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