CONFERENCE PROCEEDINGS
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Tsuyoshi Nakamura
at Tokyo Ohka Kogyo Co Ltd
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Publications (3)
Proceedings Article | 31 March 2010 Paper
Process performance of novel resist material and novel coater/developer system for cross-line contact hole process
Tsuyoshi Nakamura, Jiro Yokoya, Katsumi Ohmori, Hiroshi Nakamura, Takafumi Niwa, Hideharu Kyouda, Junichi Kitano
Proceedings Volume 7639, 76391W (2010) https://doi.org/10.1117/12.846342
KEYWORDS: Lithography, Photoresist processing, Image processing, Double patterning technology, Semiconducting wafers, Critical dimension metrology, Defect detection, Image resolution, Photomasks, Optical lithography
Proceedings Article | 26 March 2010 Paper
Process feasibility investigation of freezing free litho-litho-etch process for below 32nm hp
Tsuyoshi Nakamura, Masaru Takeshita, Jiro Yokoya, Yasuhiro Yoshii, Hirokuni Saito, Ryoichi Takasu, Katsumi Ohmori
Proceedings Volume 7639, 76392V (2010) https://doi.org/10.1117/12.846335
KEYWORDS: Lithography, Double patterning technology, Etching, Optical lithography, Photoresist processing, Immersion lithography, Image processing, Photoresist materials, Polymers, Photomasks
Proceedings Article | 1 April 2009 Paper
Newly developed positive tone resists for Posi/Posi double patterning process
Tsuyoshi Nakamura, Masaru Takeshita, Satoshi Maemori, Ryusuke Uchida, Ryoichi Takasu, Katsumi Ohmori
Proceedings Volume 7273, 727304 (2009) https://doi.org/10.1117/12.814028
KEYWORDS: Image processing, Double patterning technology, Etching, Photoresist processing, Coating, Lithography, Immersion lithography, Image resolution, Optical lithography, 193nm lithography
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