Dr. Alexander Efremov Profile

Dr. Alexander Efremov

at State Univ of Chemistry and Technology

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Author

Publications (7)

Proceedings Article | 30 December 2016 Paper

Plasma parameters and active species kinetics in CF4/O2/Ar gas mixture: effects of CF4/O2 and O2/Ar mixing ratios

Junmyung Lee, Kwang-Ho Kwon, A. Efremov

Proceedings Volume 10224, 102241U (2016) https://doi.org/10.1117/12.2266348

KEYWORDS: Oxygen, Plasma, Argon, Chemical species, Ions, Etching, Polymers, Dry etching, Carbon monoxide, Autoregressive models

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Proceedings Article | 30 December 2016 Paper

Comparative study of CF4- and CHF3-based plasmas for dry etching applications

A. Efremov, K.-H. Kwon, A. Morgunov, D. Shabadarova

Proceedings Volume 10224, 102241W (2016) https://doi.org/10.1117/12.2266715

KEYWORDS: Plasmas, Dry etching, Molecules, Argon, Ions, Chemical species, Etching, Chemistry, Carbon monoxide, Autoregressive models

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Proceedings Article | 8 January 2013 Paper

The effects of additive gases (Ar, N2, H2, Cl2, O2) on HCl plasma parameters and composition

A. Efremov, A. Yudina, A. Davlyatshina, D. Murin, V. Svetsov

Proceedings Volume 8700, 870003 (2013) https://doi.org/10.1117/12.2017138

KEYWORDS: Protactinium, Plasma, Chlorine, Oxygen, Argon, Ions, Diffusion, Ionization, Chemical species, Gases

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SPIE Journal Paper | 1 April 2009

Etching characteristics and mechanism of vanadium dioxide in inductively coupled Cl₂/Ar plasma

Tae-Hoon Lee, Alexander Efremov, Yong-Hyun Ham, Sun Jin Yun, Nam-Ki Min, Munpyo Hong, Kwang-Ho Kwon

JM3, Vol. 8, Issue 02, 021110, (April 2009) https://doi.org/10.1117/12.10.1117/1.3100423

KEYWORDS: Chlorine, Argon, Etching, Plasma, Ions, Autoregressive models, Vanadium, Plasma etching, Chemical species, Sputter deposition

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Proceedings Article | 10 June 2006 Paper

A self-consistent model for the HCl dc glow discharge: plasma parameters and active particles kinetics

A. Efremov, V. Svettsov

Proceedings Volume 6260, 626009 (2006) https://doi.org/10.1117/12.677019

KEYWORDS: Chlorine, Plasma, Particles, Chemical species, Molecules, Protactinium, Ions, Human-computer interaction, Ionization, Diffusion

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Proceedings Article | 28 May 2004 Paper

Etching mechanism of Au thin films in Cl2/Ar inductively coupled plasma

Alexander Efremov, Vladimir Svettsov, Chang-Il Kim

Proceedings Volume 5401, (2004) https://doi.org/10.1117/12.557250

KEYWORDS: Etching, Plasma, Argon, Gold, Chlorine, Ions, Thin films, Chemical species, Autoregressive models, Sputter deposition

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Proceedings Article | 28 May 2004 Paper

Volume and heterogeneous chemistry in Cl2/Ar inductively coupled plasma

Alexander Efremov, Vladimir Svettsov, Chang-Il Kim

Proceedings Volume 5401, (2004) https://doi.org/10.1117/12.557001

KEYWORDS: Plasma, Chlorine, Argon, Ions, Particles, Ionization, Chemical species, Molecules, Autoregressive models, Chemistry

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Showing 5 of 7 publications

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