Dr. Brian Cline Profile

Dr. Brian Cline

at ARM Inc

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 28 March 2017 Presentation + Paper

Efficient DSA-DP hybrid lithography conflict detection and guiding template assignment

Jiaojiao Ou, Brian Cline, Greg Yeric, David Pan

Proceedings Volume 10148, 101480C (2017) https://doi.org/10.1117/12.2258156

KEYWORDS: Directed self assembly, Error analysis, Nano opto mechanical systems, Computer simulations, Optical proximity correction, Lithography, Double patterning technology, Optical lithography, Photomasks, Shape analysis

Read Abstract +

Proceedings Article | 15 March 2016 Paper

Standard cell pin access and physical design in advanced lithography

Xiaoqing Xu, Brian Cline, Greg Yeric, David Pan

Proceedings Volume 9780, 97800P (2016) https://doi.org/10.1117/12.2222289

KEYWORDS: Lithography, Optical lithography, Design for manufacturability, Computational lithography, Optical tracking, Standards development, Metals, Design for manufacturing, Photomasks, 193nm lithography, Legal, Double patterning technology

Read Abstract +

SPIE Journal Paper | 3 February 2016

Systematic framework for evaluating standard cell middle-of-line robustness for multiple patterning lithography

Brian Cline, Greg Yeric, Bei Yu, David Pan, Xiaoqing Xu

JM3, Vol. 15, Issue 02, 021202, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021202

KEYWORDS: Lithography, Optical lithography, Photomasks, Standards development, Legal, Manufacturing, Logic, Electrochemical etching, Double patterning technology, Algorithms

Read Abstract +

Proceedings Article | 18 March 2015 Paper

A systematic framework for evaluating standard cell middle-of-line (MOL) robustness for multiple patterning

Xiaoqing Xu, Brian Cline, Greg Yeric, Bei Yu, David Pan

Proceedings Volume 9427, 942707 (2015) https://doi.org/10.1117/12.2085918

KEYWORDS: Optical lithography, Standards development, 193nm lithography, Photomasks, Lithography, Double patterning technology, Legal, Logic, Design for manufacturability, Manufacturing

Read Abstract +

Proceedings Article | 28 March 2014 Paper

Demonstrating production quality multiple exposure patterning aware routing for the 10NM node

Lars Liebmann, Vassilios Gerousis, Paul Gutwin, Mike Zhang, Geng Han, Brian Cline

Proceedings Volume 9053, 905309 (2014) https://doi.org/10.1117/12.2045958

KEYWORDS: Photomasks, Optical lithography, Metals, Double patterning technology, Etching, Image processing, Manufacturing, Lithography, Clocks, Image quality

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years