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Dr. Bridgette M. Budhlall
Senior Research Chemist at Univ of Massachusetts Lowell
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Publications (1)
Proceedings Article | 12 May 2005 Paper
High refractive index immersion fluids for 193 nm immersion lithography
Bridgette Budhlall, Gene Parris, Peng Zhang, Xiaoping Gao, Zarka Zarkov, Brenda Ross, Simon Kaplan, John Burnett
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600025
KEYWORDS: Refractive index, Absorbance, Water, Photoresist materials, Immersion lithography, Absorption, Microfluidics, Ultraviolet radiation, Semiconducting wafers, Fluid dynamics
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