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David J. Siefers
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Publications (1)
Proceedings Article | 12 May 2005 Paper
A novel mask-based approach to improve low-k1 corner and angle definition in alternating-aperture phase-shift mask structures
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.597617
KEYWORDS: Photomasks, Semiconducting wafers, Magnetism, Neck, Manufacturing, Scanning electron microscopy, Phase shifts, Optical proximity correction, Quartz, Distortion
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