Dr. Frederik Blumrich Profile

Dr. Frederik Blumrich

Innovation Manager at Carl Zeiss SMT GmbH

SPIE Involvement:

Author

Area of Expertise:

EUV mask technology , EUV mask defectivity , EUV defect mitigation , Optical metrology , Particle Image Velocimetry , Close-range photogrammetry

Websites:

Company Website

Profile Summary

Reviewer for Optical Engineering since 2012

Publications (2)

SPIE Journal Paper | 27 October 2014

Defect mitigation considerations for EUV photomasks

Anthony Garetto, Renzo Capelli, Frederik Blumrich, Krister Magnusson, Markus Waiblinger, Thomas Scherübl, Jan Hendrik Peters, Michael Goldstein

JM3, Vol. 13, Issue 04, 043006, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043006

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Scanners, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Deep ultraviolet, Atomic force microscopy, Manufacturing

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SPIE Journal Paper | 1 June 2010

Bias errors in subpixel displacement estimation for optical correlation-based measurement techniques

Frederik Blumrich

OE, Vol. 49, Issue 06, 067004, (June 2010) https://doi.org/10.1117/12.10.1117/1.3456595

KEYWORDS: Error analysis, Detection and tracking algorithms, Optical testing, Optical engineering, Reconstruction algorithms, Particles, Digital image correlation, Computer simulations, Algorithm development, Image analysis

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