Dr. Freimut Reuther Profile

Dr. Freimut Reuther

at micro resist technology GmbH

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Author

Publications (10)

Proceedings Article | 2 May 2008 Paper

Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials

Anna Klukowska, Marko Vogler, Anett Kolander, Freimut Reuther, Gabi Gruetzner, Michael Muehlberger, Iris Bergmair, Rainer Schoeftner

Proceedings Volume 6792, 67920J (2008) https://doi.org/10.1117/12.798602

KEYWORDS: Polymers, Silicon, Ultraviolet radiation, Nanoimprint lithography, Lithography, Sol-gels, Transparency, Coating, Glasses, Quartz

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Proceedings Article | 22 March 2007 Paper

Nanoimprinting with SU-8 epoxy resists

Donald Johnson, Harris Miller, Mike Kubenz, Freimut Reuther, Gabi Gruetzner

Proceedings Volume 6517, 65172A (2007) https://doi.org/10.1117/12.713710

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Epoxies, Polymers, Ultraviolet radiation, Temperature metrology, Coating, Etching, Lithography, Resistance

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Proceedings Article | 15 March 2007 Paper

mr-NIL 6000: new epoxy-based curing resist for efficient processing in combined thermal and UV nanoimprint lithography

Christine Schuster, Mike Kubenz, Freimut Reuther, Marion Fink, Gabi Gruetzner

Proceedings Volume 6517, 65172B (2007) https://doi.org/10.1117/12.713094

KEYWORDS: Annealing, Polymerization, Ultraviolet radiation, Nanoimprint lithography, Photoresist processing, Temperature metrology, Lithography, Epoxies, Polymers, Glasses

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Proceedings Article | 6 May 2005 Paper

Development of thermosets for thermal nanoimprint lithography at decreased temperatures

Freimut Reuther, Mike Kubenz, Christine Schuster, Marion Fink, Marko Vogler, Gabi Gruetzner, Juergen Grimm, Andi Kaeppel

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600851

KEYWORDS: Polymers, Nanoimprint lithography, Photoresist processing, Annealing, Polymerization, Glasses, Semiconducting wafers, Polymethylmethacrylate, Solids, Distortion

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Proceedings Article | 20 May 2004 Paper

Silanized polymeric working stamps for hot embossing lithography

Matthias Wissen, N. Bogdanski, R. Jerzy, Z. Berrada, Marion Fink, Freimut Reuther, Thomas Glinsner, Hella-Christin Scheer

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.532733

KEYWORDS: Polymers, Silicon, Polymethylmethacrylate, Molecules, Glasses, Lithography, Temperature metrology, Scanning electron microscopy, Dry etching, Plasma

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Proceedings Article | 16 June 2003 Paper

Reactive polymers: a route to nanoimprint lithography at low temperatures

Karl Pfeiffer, Freimut Reuther, Patrick Carlberg, Marion Fink, Gabi Gruetzner, Lars Montelius

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484442

KEYWORDS: Polymers, Polymerization, Nanoimprint lithography, Glasses, Etching, Polymethylmethacrylate, Plasma etching, Epoxies, Resistance, Temperature metrology

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Proceedings Article | 12 June 2003 Paper

Challenges of processing thick and ultrathick photoresist films

Mike Kubenz, Ute Ostrzinski, Freimut Reuther, Gabi Gruetzner

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485084

KEYWORDS: Photoresist materials, Coating, Optical lithography, Lithography, Infrared radiation, Photoresist processing, Semiconducting wafers, Ultraviolet radiation, Photomasks, Silicon

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Proceedings Article | 20 August 2001 Paper

Mix and match of nanoimprint and UV lithography

Freimut Reuther, Karl Pfeiffer, Marion Fink, Gabi Gruetzner, Hubert Schulz, Hella-Christin Scheer, Freddy Gaboriau, Christophe Cardinaud

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436708

KEYWORDS: Nanoimprint lithography, Lithography, Ultraviolet radiation, Plasmas, Glasses, Polymers, Etching, Nanotechnology, Photoresist materials, Optical lithography

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Proceedings Article | 23 June 2000 Paper

Tailored novolak resins for advanced photoresists by a two-step procedure: new insight into the molecular structure is achieved by coupling GPC and MALDI-TOF-MS

Freimut Reuther, Ralph-Peter Krueger, Guenter Schulz, Guenther Baehr, Ulrich Westerwelle, Gabi Gruetzner

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388296

KEYWORDS: Photoresist materials, Polymers, Calibration, Sodium, Molecules, Molecular lasers, Molecular spectroscopy, Chromatography, Testing and analysis, Manufacturing

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Proceedings Article | 6 February 1997 Paper

Stable polymer chromophore systems for nonlinear optics

Sigurd Schrader, Karl Pfeiffer, Freimut Reuther, Hans-Joachim Lorkowski

Proceedings Volume 2968, (1997) https://doi.org/10.1117/12.266808

KEYWORDS: Polymers, Chromophores, Electro optic polymers, Personal digital assistants, Temperature metrology, Glasses, Polarization, Complex systems, Electro optics, Talc

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Showing 5 of 10 publications

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