Mr. Matthias Wissen Profile

Matthias Wissen

at Bergische Univ Wuppertal

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Author

Publications (10)

Proceedings Article | 2 May 2008 Paper

Strategies for hybrid techniques of UV lithography and thermal nanoimprint

M. Wissen, N. Bogdanski, S. Moellenbeck, H.-C. Scheer

Proceedings Volume 6792, 67920V (2008) https://doi.org/10.1117/12.798935

KEYWORDS: Photoresist materials, Ultraviolet radiation, Lithography, Photomasks, Nanoimprint lithography, Sensors, Electrodes, Silicon, Coating, Temperature metrology

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Proceedings Article | 3 May 2007 Paper

Challenges of residual layer minimisation in thermal nanoimprint lithography

Nicolas Bogdanski, Matthias Wissen, Saskia Möllenbeck, Hella-Christin Scheer

Proceedings Volume 6533, 65330Q (2007) https://doi.org/10.1117/12.736926

KEYWORDS: Polymers, Nanoimprint lithography, Photomasks, Lithography, Capillaries, Optical lithography, Inspection, Silicon, Scanning electron microscopy, Photomicroscopy

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Proceedings Article | 16 June 2005 Paper

Pattern-induced non-uniformity of residual layers in nanoimprint lithography

Nicolas Bogdanski, Matthias Wissen, Hella-Christin Scheer

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637299

KEYWORDS: Polymers, Sensors, Nanoimprint lithography, Microelectromechanical systems, Photomasks, Lithography, Optical lithography, Dry etching, Etching, Reactive ion etching

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Proceedings Article | 6 May 2005 Paper

Alignment issues in a modular hot embossing system

M. Wissen, T. Glinsner, N. Bogdanski, H.-C. Scheer, G. Gruetzner

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599808

KEYWORDS: Optical alignment, Silicon, Semiconducting wafers, Ultraviolet radiation, Polymers, Photoresist processing, Lithography, Nanoimprint lithography, Fluorine, Coating

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Proceedings Article | 2 June 2004 Paper

Dynamic mask defects in hot embossing lithography

N. Bogdanski, Hubert Schulz, Matthias Wissen, Hella-Christin Scheer

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568034

KEYWORDS: Polymers, Photomasks, Etching, Lithography, Oxygen, Reactive ion etching, Nanoimprint lithography, Silicon, Picosecond phenomena, Glasses

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Proceedings Article | 20 May 2004 Paper

Nanostructuring of polymers by hot embossing lithography

Hella-Christin Scheer, Thomas Glinsner, Matthias Wissen, Rainer Pelzer

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535741

KEYWORDS: Polymers, Lithography, Nanoimprint lithography, Glasses, Nanostructuring, Scanning electron microscopy, Manufacturing, Nanotechnology, Optical alignment, Visible radiation

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Proceedings Article | 20 May 2004 Paper

Silanized polymeric working stamps for hot embossing lithography

Matthias Wissen, N. Bogdanski, R. Jerzy, Z. Berrada, Marion Fink, Freimut Reuther, Thomas Glinsner, Hella-Christin Scheer

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.532733

KEYWORDS: Polymers, Silicon, Polymethylmethacrylate, Molecules, Glasses, Lithography, Temperature metrology, Scanning electron microscopy, Dry etching, Plasma

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Proceedings Article | 2 September 2003 Paper

Large-area definition of nano-electrodes by nanoimprint lithography

Matthias Wissen, Hella-Christin Scheer, Hubert Schulz, J. Horstmann, M. Scherff, Wolfgang Fahrner

Proceedings Volume 5253, (2003) https://doi.org/10.1117/12.521470

KEYWORDS: Electrodes, Polymers, Etching, Nanoimprint lithography, Dry etching, Silicon, Lithography, Semiconducting wafers, Electron beam lithography, Photomasks

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Proceedings Article | 16 June 2003 Paper

Impact of vacuum environment on the hot embossing process

Nils Roos, Matthias Wissen, Thomas Glinsner, Hella-Christin Scheer

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482750

KEYWORDS: Polymers, Semiconducting wafers, Lithography, Visualization, Photomicroscopy, Optical lithography, Photomasks, Particles, Temperature metrology, Nanoimprint lithography

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Proceedings Article | 1 July 2002 Paper

Low-temperature wafer-scale warm embossing for mix and match with UV lithography

Hubert Schulz, Matthias Wissen, Nils Roos, Hella-Christin Scheer, Karl Pfeiffer, Gabi Gruetzner

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472295

KEYWORDS: Ultraviolet radiation, Glasses, Lithography, Semiconducting wafers, Polymers, Scanning electron microscopy, Nanoimprint lithography, Epoxies, Photoresist processing, Floods

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Showing 5 of 10 publications

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