Mr. James Methven Dykes Profile

James Methven Dykes

at Simon Fraser Univ

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 14 February 2011 Paper

Bimetallic grayscale photomasks written using optical density feedback control

James Dykes, Reza Qarehbaghi, Glenn Chapman

Proceedings Volume 7927, 792719 (2011) https://doi.org/10.1117/12.876234

KEYWORDS: Photomasks, Transparency, Raster graphics, Feedback control, Sensors, Optical lithography, Objectives, Thin films, Argon ion lasers, Absorbance

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Proceedings Article | 23 September 2009 Paper

Enhanced laser-writing techniques for bimetallic grayscale photomasks

James Dykes, Glenn Chapman

Proceedings Volume 7488, 74880O (2009) https://doi.org/10.1117/12.829743

KEYWORDS: Sensors, Photomasks, Calibration, Optical lithography, Argon ion lasers, Thin films, Sputter deposition, Indium, Optical filters, Glasses

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Proceedings Article | 24 February 2009 Paper

Optical characterization of the mask writing process in bimetallic grayscale photomasks

James Dykes, Glenn Chapman

Proceedings Volume 7201, 72010S (2009) https://doi.org/10.1117/12.809975

KEYWORDS: Photomasks, Indium, Calibration, Optical lithography, Bismuth, Sputter deposition, Tin, Sensors, Thin films, Optical filters

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Proceedings Article | 17 October 2008 Paper

Effects of heated substrates on bimetallic thermal resist for lithography and grayscale photomask applications

James Dykes, Polly Tsui, Jenny Leung, Glenn Chapman

Proceedings Volume 7122, 71220M (2008) https://doi.org/10.1117/12.801560

KEYWORDS: Argon ion lasers, Photomasks, Laser systems engineering, Nd:YAG lasers, Transparency, Laser development, Objectives, Thin films, Sensors, Calibration

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Proceedings Article | 6 February 2008 Paper

Enhancing direct-write laser control techniques for bimetallic grayscale photomasks

James Dykes, Calin Plesa, Glenn Chapman

Proceedings Volume 6883, 688312 (2008) https://doi.org/10.1117/12.765006

KEYWORDS: Photomasks, Cameras, Transparency, Profilometers, Sensors, Optical lithography, Camera shutters, Electro optics, Argon ion lasers, Calibration

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Proceedings Article | 1 November 2007 Paper

Bimetallic thermal resists potential for double-exposure immersion lithography and grayscale photomasks

James Dykes, Calin Plesa, Chinheng Choo, Glenn Chapman

Proceedings Volume 6730, 673040 (2007) https://doi.org/10.1117/12.746990

KEYWORDS: Photomasks, Transparency, Sensors, Immersion lithography, Optical lithography, Argon ion lasers, Calibration, Thin films, Lithography, Photodiodes

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Proceedings Article | 13 March 2007 Paper

Improving the optical characteristics of bimetallic grayscale photomasks

James Dykes, David Poon, Jun Wang, Jimmy Tsui, Glenn Chapman

Proceedings Volume 6458, 64580T (2007) https://doi.org/10.1117/12.702589

KEYWORDS: Photomasks, Argon ion lasers, Thin films, Binary data, Cameras, Raster graphics, Glasses, Video, Optical filters, CCD cameras

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Proceedings Article | 22 January 2007 Paper

Creation of embedded structures in SU-8

James Dykes, David Poon, Jun Wang, Dan Sameoto, Jimmy T. K. Tsui, Chinheng Choo, Glenn Chapman, Ash Parameswaren, Bonnie Gray

Proceedings Volume 6465, 64650N (2007) https://doi.org/10.1117/12.702876

KEYWORDS: Photomasks, Ultraviolet radiation, Semiconducting wafers, Quartz, Bridges, Glasses, Scanning electron microscopy, Microscopes, Binary data, Photoresist materials

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Proceedings Article | 20 October 2006 Paper

Adding grayscale layer to chrome photomasks

David Poon, James Dykes, Chinheng Choo, Jimmy T. Tsui, Jun Wang, Glenn Chapman, Yuqiang Tu, Patrick Reynolds, Andrew Zanzal

Proceedings Volume 6349, 634931 (2006) https://doi.org/10.1117/12.686599

KEYWORDS: Photomasks, Argon ion lasers, Binary data, Photoresist materials, Reticles, Optical lithography, Thin films, Calibration, Glasses, Oxidation

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Proceedings Article | 4 May 2005 Paper

Enhanced inorganic bimetallic thermal resists transparency and resolution for photomask fabrication

Glenn Chapman, David Poon, Chinheng Choo, Yuqiang Tu, James Dykes, Jun Wang, Jun Peng, Willy Lennard, Karen Kavanagh

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600463

KEYWORDS: Photomasks, Glasses, Photoresist materials, Silicon, Aluminum, Absorbance, Transparency, Silicon films, Lithography, Oxidation

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Proceedings Article | 12 April 2005 Paper

Creating precise 3D microstructures using laser direct-write bimetallic thermal resist grayscale photomasks

Glenn Chapman, James Dykes, David Poon, Chinheng Choo, Jun Wang, Jun Peng, Yuqiang Tu

Proceedings Volume 5713, (2005) https://doi.org/10.1117/12.601545

KEYWORDS: Photoresist materials, Photomasks, Glasses, Silicon, Photoresist developing, Lithography, Calibration, Raster graphics, Silicon films, Camera shutters

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Proceedings Article | 6 December 2004 Paper

Calibrating grayscale direct write bimetallic photomasks to create 3D photoresist structures

Yuqiang Tu, Glenn Chapman, James Dykes, David Poon, Chinheng Choo, Jun Peng

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569405

KEYWORDS: Photomasks, Photoresist materials, Calibration, Raster graphics, Camera shutters, Absorbance, Tin, Silicon, Transparency, Binary data

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Proceedings Article | 17 December 2003 Paper

Creating direct-write gray-scale photomasks with bimetallic thin film thermal resists

Glenn Chapman, Yuqiang Tu, James Dykes, Masahiko Mio, Jun Peng

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518213

KEYWORDS: Photomasks, Bismuth, Absorption, Photoresist materials, Glasses, Argon ion lasers, Raster graphics, Semiconductor lasers, Binary data, Absorbance

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Showing 5 of 13 publications

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