Dr. Jeff Mackey Profile

Dr. Jeff Mackey

at ON Semiconductor

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Publications (1)

Proceedings Article | 15 March 2007 Paper

Initial experience establishing an EUV baseline lithography process for manufacturability assessment

O. Wood, D. Back, R. Brainard, G. Denbeaux, D. Goldfarb, F. Goodwin, J. Hartley, K. Kimmel, C. Koay, B. La Fontaine, J. Mackey, B. Martinick, W. Montgomery, P. Naulleau, U. Okoroanyanwu, K. Petrillo, B. Pierson, M. Tittnich, S. Trogisch, T. Wallow, Y. Wei

Proceedings Volume 6517, 65170U (2007) https://doi.org/10.1117/12.714016

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Reticles, Photomasks, Contamination, Reflectivity, Microscopes, Image resolution, Manufacturing, Lithography

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