The setting up of experimental techniques, the synergic use of ellipsometry systems and synchrotron light sources are pivotal in the characterization and optimization of thin films devoted to EUV–VUV applications. The present manuscript will go through the research methods and the results obtained at CNR–IFN laboratories, by explaining the approaches adopted on the study of novel materials for the development of high throughputs EUV–VUV transmission filters, reflective coatings and phase retarders.
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