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Keisuke Kato
at Mitsubishi Rayon Co Ltd
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Author
Publications (3)
Proceedings Article | 29 March 2013 Paper
Novel ArF photoresist polymer to suppress the roughness formation in plasma etching processes
Keisuke Kato, Atsushi Yasuda, Shin-ichi Maeda, Takuji Uesugi, Takeru Okada, Akira Wada, Seiji Samukawa
Proceedings Volume 8682, 86821R (2013) https://doi.org/10.1117/12.2011096
KEYWORDS: Photoresist materials, Polymers, Etching, Plasma etching, Plasma, Chemical reactions, Polymer thin films, Surface roughness, Chlorine, Chemical analysis
Proceedings Article | 24 December 2011 Paper
Plasmonic nanofocusing by axicon-shape Kretschmann configuration
Atsushi Ono, Hiroki Sano, Wataru Inami, Keisuke Kato, Yoshimasa Kawata
Proceedings Volume 8204, 82041R (2011) https://doi.org/10.1117/12.904738
KEYWORDS: Prisms, Polarization, Surface plasmons, Axicons, Plasmonics, Light scattering, Scattering, Gold, Gaussian beams, Photons
Proceedings Article | 16 April 2011 Paper
Primary structure control of ArF resist polymer by regulating feed rate of monomers and initiator
Proceedings Volume 7972, 79721U (2011) https://doi.org/10.1117/12.879421
KEYWORDS: Polymers, Polymerization, Homogenization, Scanning probe microscopy, Lithography, Photoresist materials, Polymer thin films, Semiconducting wafers, Photoresist developing, Aluminum
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