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Kurt S. Werder
Engineer at Onto Innovation Inc
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Publications (1)
Proceedings Article | 7 July 1997 Paper
SCALPEL proof-of-concept system: preliminary lithography results
Warren Waskiewicz, Christopher Biddick, Myrtle Blakey, Kevin Brady, Ron Camarda, Wayne Connelly, A. Crorken, J. Custy, R. DeMarco, Reginald Farrow, Joseph Felker, Linus Fetter, Richard Freeman, Lloyd Harriott, Leslie Hopkins, Harold Huggins, Richard Kasica, Chester Knurek, Joseph Kraus, James Liddle, Masis Mkrtchyan, Anthony Novembre, Milton Peabody, Len Rutberg, Harry Wade, Pat Watson, Kurt Werder, David Windt, Regine Tarascon-Auriol, Steven Berger, Stephen Bowler
Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275786
KEYWORDS: Photomasks, Charged-particle lithography, Lithography, Printing, Semiconducting wafers, Etching, Silicon, Scanning electron microscopy, Photomicroscopy, Backscatter
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