Dr. Thomas Cardolaccia Profile

Dr. Thomas Cardolaccia

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

High contact angle embedded barrier layer materials for next-generation 193 immersion lithography

Joshua Kaitz, Mingqi Li, Ryan Lee, Amy Kwok, Thomas Cardolaccia, Amiel Evans, Choong-Bong Lee, Xisen Hou, Ke Yang

Proceedings Volume 11612, 116120U (2021) https://doi.org/10.1117/12.2583735

KEYWORDS: Polymers, Semiconducting wafers, Lithography, Water, Photoresist materials, Immersion lithography, Coating, 193nm lithography, Surface properties, Semiconductor manufacturing, Polymer chemistry

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