Unspecified Yuan Hsu Profile

Yuan Hsu

at Photronics DNP Mask Corp

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 10 April 2024 Poster + Paper

Study of ArF phase shift masks radiation damage induced scum defect

Yuan Hsu, Kenko Tsai, Angus Chin, David Wang

Proceedings Volume 12953, 129531E (2024) https://doi.org/10.1117/12.3010170

KEYWORDS: Chromium, Photomasks, Phase shifts, Oxidation, Molybdenum, Air contamination, Quartz, Laser radiation, Excimer lasers, Associative arrays

Read Abstract +

Proceedings Article | 9 April 2024 Poster + Paper

Resist develop optimize to improve CDU and reduce process defect

Yuan Hsu, Fumitaka Kameyama

Proceedings Volume 12957, 129571L (2024) https://doi.org/10.1117/12.3009778

KEYWORDS: Nozzles, Photoresist processing, Lithography, SRAF, Etching, Image processing, Chromium, Source mask optimization, Semiconducting wafers, Electron beam melting

Read Abstract +

Proceedings Article | 9 April 2024 Poster + Paper

Study of acicular defects in the post-exposure bake process airborne molecular contamination

Yuan Hsu, David Wang, Miky Yeh

Proceedings Volume 12957, 129571I (2024) https://doi.org/10.1117/12.3009744

KEYWORDS: Tunable filters, Contamination, Image processing, Particles, Photoresist processing, Inspection, Mask cleaning, Environmental sensing, Protactinium, Polymers

Read Abstract +

Proceedings Article | 28 April 2023 Poster + Paper

Surface treatment to reduce process defects

Yuan Hsu, Edison Yang, Mochihiro Shimizu

Proceedings Volume 12494, 124941A (2023) https://doi.org/10.1117/12.2646601

KEYWORDS: Aluminum, Plasma, Etching, Plasma treatment, Alloys, Particles, Vacuum chambers, Scanning electron microscopy, Inspection, Failure analysis

Read Abstract +

Proceedings Article | 1 December 2022 Poster + Paper

A study of rare contamination defects come in a vacuum chamber

Yuan Hsu, Will Hsiao, Cy Huang, Leo Lo, Michael Morgan, Yukihide Kajimoto

Proceedings Volume 12293, 122930T (2022) https://doi.org/10.1117/12.2627280

KEYWORDS: Thin films, Plasma, Chlorine, Particles, Contamination, Electrodes, Aluminum, Scanning electron microscopy, Inspection, Etching

Read Abstract +

Proceedings Article | 27 June 2019 Paper

A study of airborne molecular contamination to Cr etching process

Yuan Hsu, Yutaka Satou, Heng-Jen Lee, Zack Huang

Proceedings Volume 11178, 111780M (2019) https://doi.org/10.1117/12.2530983

KEYWORDS: Contamination, Chromium, Etching, Chlorine, Plasma, Particles, Inspection, Photomasks, Dry etching, Scanning electron microscopy

Read Abstract +

Proceedings Article | 12 June 2018 Paper

Advanced ceramic protective lifetime prolong for particle control

Yuan Hsu, Yutaka Satou

Proceedings Volume 10807, 108070J (2018) https://doi.org/10.1117/12.2318943

KEYWORDS: Coating, Plasma, Plasma treatment, Chlorine, Sputter deposition, Particles, Fluorine, Ceramics, Carbon, X-rays

Read Abstract +

Proceedings Article | 13 July 2017 Paper

Mask crosstalk defect between develop to etch process

Yuan Hsu, Hong-Jen Lee

Proceedings Volume 10454, 104540T (2017) https://doi.org/10.1117/12.2275540

KEYWORDS: Etching, Dry etching, Particles, Photomasks, Inspection, Defect inspection, Chromium, Photoresist developing, Reactive ion etching, Defect detection

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years