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Yuan Li
at Institute of Applied Electronics CAEP
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Publications (1)
Proceedings Article | 12 May 2017 Paper
The infrared spectra and laser damage threshold of the fused silica after megacoustic field assisted hydrofluoric-based etching
Proceedings Volume 10173, 101730C (2017) https://doi.org/10.1117/12.2267745
KEYWORDS: Infrared radiation, Silica, Etching, Laser damage threshold, Laser induced damage, Silicon, Absorption, Surface finishing, Polishing, Optics manufacturing
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