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Jisun Lee
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Publications (1)
Proceedings Article | 1 December 2022 Presentation + Paper
Early defect detection for EUV self-aligned litho-etch litho-etch patterning with EPE
Roy Anunciado, Jisun Lee, Ellaheh Barzegar, Stefan van der Sanden, Guillaume Schelcher, Stijn Schoofs
Proceedings Volume 12292, 122920J (2022) https://doi.org/10.1117/12.2637772
KEYWORDS: Line edge roughness, Etching, Semiconducting wafers, Optical lithography, Critical dimension metrology, Amorphous silicon, Scanning electron microscopy, Dielectrics, Overlay metrology, Photomasks
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