Mr. Alexander Egl Profile

Alexander Egl

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Publications (1)

Proceedings Article | 26 August 2024 Paper

Improvement of mask pattern placement error using novel resist charging control methodology in multi-beam mask writer

Hyoyeon Kim, Hyungrae Noh, Wonsik Shin, Kangho Park, Youngjae Lee, Sangho Jo, Youngsu Sung, Hojune Lee, Heebom Kim, Jin Choi, Sanghee Lee, Alexander Egl, Gottfried Hochleitner, Matthias Kühmayer, Matthias Liertzer, Francesco Massa, Mathias Tomandl

Proceedings Volume 13177, 131770V (2024) https://doi.org/10.1117/12.3032199

KEYWORDS: Error analysis, Semiconducting wafers, Calibration, Logic, Overlay metrology, Logic devices, Simulations, Palladium, Optical alignment, Image registration, Photomasks

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