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Chenchen Zhang
at Institute of Microelectronics of the CAS
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Publications (1)
Proceedings Article | 9 April 2024 Presentation + Paper
Study of selective dry etching Si0.7Ge0.3 with different plasma source in process of gate-all-around FET
Enxu Liu, Chaoran Yang, Junjie Li, Na Zhou, Longrui Xia, Rui Chen, Hua Shao, Jianfeng Gao, Zhenzhen Kong, Chenchen Zhang, Panpan Lai, Tao Yang, Yayi Wei, Junfeng Li, Jun Luo, Wenwu Wang
Proceedings Volume 12958, 129580F (2024) https://doi.org/10.1117/12.3010332
KEYWORDS: Etching, Plasma, Silicon, Dry etching, Field effect transistors, Gallium arsenide, Transistors, Particles, Resistance, Reflection
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