Dr. Eui-Kyoon Kim Profile

Dr. Eui-Kyoon Kim

Process Engineer at Spansion Inc

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Author

Publications (4)

SPIE Journal Paper | 1 July 2008

Role of surfactants in adhesion reduction for step and flash imprint lithography

Michael Lin, Daniel Hellebusch, Kai Wu, Eui Kim, Kuan-Hsun Lu, Kenneth Liechti, John Ekerdt, Paul Ho, C. Grant Willson

JM3, Vol. 7, Issue 03, 033005, (July 2008) https://doi.org/10.1117/12.10.1117/1.2968269

KEYWORDS: Polymers, Interfaces, Quartz, Adhesives, Etching, Liquids, Silicon, Lithography, Mechanics, Natural surfaces

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Proceedings Article | 27 March 2006 Paper

Planarization for Reverse-Tone Step and Flash Imprint Lithography

Michael Lin, Huang-Lin Chao, Jianjun Hao, Eui Kim, Frank Palmieri, Woon Kim, Michael Dickey, Paul Ho, C. Willson

Proceedings Volume 6151, 61512G (2006) https://doi.org/10.1117/12.655626

KEYWORDS: Etching, Silicon, Lithography, Capillaries, Thin films, Silicon films, Safety, Interferometry, Semiconducting wafers, Photomasks

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Proceedings Article | 6 May 2005 Paper

Direct imprinting of dielectric materials for dual damascene processing

Michael Stewart, Jeffery Wetzel, Gerard Schmid, Frank Palmieri, Ecron Thompson, Eui Kyoon Kim, David Wang, Ken Sotodeh, Kane Jen, Stephen Johnson, Jianjun Hao, Michael Dickey, Yukio Nishimura, Richard Laine, Douglas Resnick, C. Willson

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599977

KEYWORDS: Dielectrics, Silicon, Copper, Semiconducting wafers, Optical lithography, Etching, Lithography, Metals, Nanoimprint lithography, Plasma etching

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Proceedings Article | 20 May 2004 Paper

Mesoscale modeling for SFIL simulating polymerization kinetics and densification

Ryan Burns, Stephen Johnson, Gerard Schmid, Eui Kim, Michael Dickey, Jason Meiring, Sean Burns, Nicholas Stacey, C. Grant Willson, Diana Convey, Yi Wei, Peter Fejes, Kathleen Gehoski, David Mancini, Kevin Nordquist, William Dauksher, Douglas Resnick

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536216

KEYWORDS: Etching, Polymerization, Molecules, Monte Carlo methods, Finite element methods, Lithography, Ultraviolet radiation, Molecular interactions, Scanning electron microscopy, Optical lithography

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