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Gerald E. Weineck
Chemical Engineer at Donaldson Co Inc
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Publications (4)
Proceedings Article | 13 March 2018 Paper
Improved airborne molecular contaminant filter performance for photolithography
Gerald Weineck, Brian Hoang, Joshua Lais
Proceedings Volume 10586, 105861A (2018) https://doi.org/10.1117/12.2297034
KEYWORDS: Carbon, Silicon, Optical lithography, Semiconductors, Contamination, Gases, Chemistry, Lithography
Proceedings Article | 2 April 2010 Paper
AMC control in photolithography: the past decade in review
Gerald Weineck, Dustin Zastera, Andrew Dallas
Proceedings Volume 7638, 76383H (2010) https://doi.org/10.1117/12.847258
KEYWORDS: Contamination, Industrial chemicals, Deep ultraviolet, Gases, Carbon, Optical lithography, Head-mounted displays, Natural surfaces, Silicon, Chemistry
Proceedings Article | 24 March 2008 Paper
Rationalizing the mechanism of HMDS degradation in air and effective control of the reaction byproducts
Proceedings Volume 6922, 692230 (2008) https://doi.org/10.1117/12.772998
KEYWORDS: Head-mounted displays, Carbon, FT-IR spectroscopy, Humidity, Contamination, Adsorption, Calibration, Semiconducting wafers, Lithography, Absorbance
Proceedings Article | 5 April 2007 Paper
Low-pressure drop filtration of airborne molecular organic contaminants using open-channel networks
Andrew Dallas, Jon Joriman, Lefei Ding, Gerald Weineck, Kevin Seguin
Proceedings Volume 6518, 651846 (2007) https://doi.org/10.1117/12.708302
KEYWORDS: Carbon, Silicon, Head-mounted displays, Adsorption, Fluctuations and noise, Chemistry, Contamination, Semiconductor manufacturing, Humidity, Silicon carbide
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