Ms. Hee-Ra No Profile

Hee-Ra No

at Hanyang Univ

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Publications (2)

Proceedings Article | 9 October 2018 Presentation + Paper

Pattern degradation with larger particles on EUV pellicle

Hee-Ra No, Sung-Gyu Lee, Se-Hun Oh, Hye-Keun Oh

Proceedings Volume 10809, 108091G (2018) https://doi.org/10.1117/12.2502784

KEYWORDS: Particles, Extreme ultraviolet, Pellicles, Critical dimension metrology, Optical lithography, Extreme ultraviolet lithography, Photomasks, Contamination, Applied physics, Lithography

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Proceedings Article | 24 March 2017 Paper

CD error caused by aberration and its possible compensation by optical proximity correction in extreme-ultraviolet lithography

Jeong-Gu Hwang, In-Seon Kim, Guk-Jin Kim, Hee-Ra No, Byung-Hun Kim, Hye-Keun Oh

Proceedings Volume 10143, 101431U (2017) https://doi.org/10.1117/12.2261827

KEYWORDS: Critical dimension metrology, Optical proximity correction, Extreme ultraviolet lithography, Distortion, Extreme ultraviolet, Tolerancing, Photomasks, Monochromatic aberrations, Optical lithography, Optical calibration, Scanners, Lithography

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