Mr. Hyoung-Ryeun Kim Profile

Hyoung-Ryeun Kim

at SK Hynix Inc

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Author

Publications (6)

Proceedings Article | 13 March 2018 Paper

Effects of fluorine contamination on spin-on dielectric thickness in semiconductor manufacturing

Hyoung-ryeun Kim, Soonsang Hong, Samyoung Kim, Changyeol Oh, Sung Min Hwang

Proceedings Volume 10586, 105861M (2018) https://doi.org/10.1117/12.2297309

KEYWORDS: Semiconducting wafers, Contamination, Fluorine, Silicon, Coating, Dielectrics, Silicon films, Semiconductor manufacturing, Chemical mechanical planarization, Interfaces

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Proceedings Article | 21 March 2006 Paper

Implementation of contact hole patterning performance with KrF resist flow process for 60nm node DRAM application

Hyoung-ryeun Kim, Yeong-Bae Ahn, JongKuk Kim, SeokKyun Kim, DongHeok Park, Young-Sik Kim

Proceedings Volume 6154, 615441 (2006) https://doi.org/10.1117/12.659398

KEYWORDS: Optical lithography, Photoresist processing, Photoresist materials, Semiconducting wafers, Lithography, Etching, Cadmium sulfide, Oxides, Lithographic illumination, Scanning electron microscopy

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Proceedings Article | 12 May 2005 Paper

Implementation of contact hole patterning performance with KrF resist flow process for 80nm DRAM application

Hyoung-ryeun Kim, DongHeok Park, HyeongSoo Kim

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600254

KEYWORDS: Optical lithography, Photoresist processing, Photoresist materials, Semiconducting wafers, Lithography, 193nm lithography, Cadmium, Etching, Semiconductors, Oxides

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Proceedings Article | 12 May 2005 Paper

Implementation of KrF 0.29 k1 lithography

Hyeong Soo Kim, Seok Kyun Kim, Young Sik Kim, Sang Man Bae, Dong Heok Park, Young Deuk Kim, Yoon Suk Hyun, Hyoung Reun Kim, Keun Kyu Kong, Min Seok Son, Yong Soon Jung, Bong Ho Choi

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598610

KEYWORDS: Lithography, Photomasks, Optical lithography, Quartz, Optical proximity correction, Device simulation, Lithographic illumination, Manufacturing, Scanners, Photography

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Proceedings Article | 26 June 2003 Paper

Printing 95-nm DRAM full chip patterns in KrF lithography

Seok-Kyun Kim, Jin-Soo Kim, Tae-Jun Yoo, Keun-Kyu Kong, Hyoung-Soon Yun, Young-Deuk Kim, Hyoung-Ryeun Kim, Young-Sik Kim, Hyeong-Soo Kim

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485435

KEYWORDS: Lithography, Lithographic illumination, Photomasks, Photoresist processing, Printing, Etching, Semiconducting wafers, Critical dimension metrology, Forward error correction, Optical proximity correction

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Proceedings Article | 12 June 2003 Paper

Effects of alkali treatment on ArF resist process

Jin-Soo Kim, Jae-Chang Jung, Keun-Kyu Kong, Hyoung-Ryeun Kim, Hyeong-Soo Kim

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483749

KEYWORDS: Monochromatic aberrations, Photoresist processing, Lithography, Cadmium sulfide, Electroluminescence, Photomasks, 193nm lithography, Silicon, Semiconductors, Reliability

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Showing 5 of 6 publications

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