Dr. Jean B. Hue Profile

Dr. Jean B. Hue

Scientist at CEA-LETI

SPIE Involvement:

Author

Publications (27)

Proceedings Article | 11 March 2024 Presentation + Paper

Heterodyne detection for optical FMCW LiDAR: tests, analysis, and experimental comparisons between photodetectors and configurations

J. Hue, V. Moulin, L. Oxaran, V. Berg, V. Rat, K. Abdoul-Carime, B. Dupont, S. Martin, F. Sermet, S. Stanchina, D. Fowler, S. Guerber, L. Virot, J. Meilhan, F. Simoens

Proceedings Volume 12893, 1289307 (2024) https://doi.org/10.1117/12.3000056

KEYWORDS: Signal to noise ratio, Photodetectors, LabVIEW, Relative intensity noise, Heterodyning, Photodiodes, LIDAR

Read Abstract +

Proceedings Article | 8 March 2023 Presentation + Paper

An upgradable testing platform designed to characterize and test optical components of FMCW LiDARs, particularly optical phased arrays

J. Hue, V. Moulin, K. Abdoul-Carime, V. Berg, B. Delplanque, B. Dupont, D. Fowler, S. Guerber, J. Meilhan, S. Martin, L. Mendizabal, T. Mourier, L. Oxaran, F. Rigal, F. Sermet, S. Stanchina, V. Rat, L. Virot, F. Simoens

Proceedings Volume 12428, 124280A (2023) https://doi.org/10.1117/12.2647535

KEYWORDS: Signal to noise ratio, Photodetectors, LIDAR, Laser frequency, Interferometers, Heterodyning, Signal detection, Phased array optics, Quantum shot noise, Photonic integrated circuits

Read Abstract +

Proceedings Article | 5 March 2022 Presentation

Device and circuit development for optical phased arrays

Daivid Fowler, Sylvain Guerber, Leopold Virot, Jonathan Faugier-Tovar, Philippe Grosse, Jerome Meilhan, Kim Abdoul-Carime, Jean Hue, Baptiste Delplanque, François Simoens, Bertrand Szelag

Proceedings Volume PC12004, PC120040H (2022) https://doi.org/10.1117/12.2606186

KEYWORDS: Phased array optics, Optical circuits, Optical antennas, Modulators, Waveguides, Transceivers, Three dimensional sensing, Semiconducting wafers, Phased arrays, Phase shifts

Read Abstract +

Proceedings Article | 5 March 2022 Presentation + Paper

Modular and versatile characterization test bench for optical phased arrays

J. Hue, V. Moulin, K. Abdoul-Carime, A. Aitmani, L. Boutafa, O. Castany, B. Delplanque, J. Faugier-Tovar, D. Fowler, S. Guerber, G. Lasfargues, J. Meilhan, L. Mendizabal, T. Mourier, N. Miloud-Ali, F. Sermet, S. Stanchina, B. Szelag, L. Virot, F. Simoens

Proceedings Volume 12008, 120080I (2022) https://doi.org/10.1117/12.2607724

KEYWORDS: Infrared cameras, Near field optics, Calibration, Photodiodes, Phased array optics, Phase shifts, Packaging, Lenses, Temperature metrology

Read Abstract +

Proceedings Article | 5 March 2013 Paper

Towards an easy-to-use tuberculosis diagnosis through exhaled breath analysis: a liquid fluorimeter with an excitation at 265 nm

J. Hue, M. Dupoy, S. Vignoud, J. Ricaud, T. Tran-Thi, S. Karpe, A. Novelli-Rousseau, F. Mallard

Proceedings Volume 8570, 85700N (2013) https://doi.org/10.1117/12.2000553

KEYWORDS: Luminescence, Optical filters, Liquids, Signal detection, Optical fibers, Charge-coupled devices, Fluorescence spectroscopy, CCD cameras, Diagnostics, Magnesium

Read Abstract +

Proceedings Article | 6 May 2005 Paper

EUV mask blank activities at LETI: defect detection at 80 nm

J. Hue, E. Quesnel, V. Muffato, M. Vabre, S. Favier

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.595040

KEYWORDS: Mirrors, Silicon, Extreme ultraviolet, Light scattering, Defect detection, Particles, Deposition processes, Photomasks, Cameras, Glasses

Read Abstract +

Proceedings Article | 16 June 2003 Paper

EUV mask blank: defect detection at 100 nm

Jean Hue, Etienne Quesnel, Catherine Pelle, Viviane Muffato, G Carini, Sylvie Favier, Pascal Besson

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482329

KEYWORDS: Particles, Silicon, Defect detection, Extreme ultraviolet, Scattering, Light scattering, CCD cameras, Rayleigh scattering, Glasses, Semiconducting wafers

Read Abstract +

Proceedings Article | 20 August 2001 Paper

Automated set-up for extreme-ultraviolet mask lithography: the first step to count and clean in one

Jean Hue, Viviane Muffato, Catherine Pelle, Etienne Quesnel, Pierre Garrec, Francoise Baume

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436718

KEYWORDS: Particles, Light scattering, Mirrors, Extreme ultraviolet, Laser scattering, Silicon, Scattering, Defect detection, Opacity, Extreme ultraviolet lithography

Read Abstract +

As a participant of the French Extreme UltraViolet (EUV) program PREUVE, our laboratory has been involved for one year in the development of Mo/Si blanks free of defects using an Ion Beam Sputtering deposition technique (IBS). Among the different tasks to end at an EUV stepper, the achievement of the blank and its characterization in terms of defect counting is probably one of the most challenging. This is the reason why a characterization tool based on the well known scattering method is under progress in our laboratory. In addition to defect counting, the possibility of cleaning a sample (substrate, blanks,.) with a powerful laser source is allowed on the same facility. This set up is fully computerized. Its first performances are illustrated with several examples on our blanks and silicon substrates. Our system is designed to optimize the laser cleaning parameters (wavelength, incidence, polarization,.) and to decrease the detection limit size. Today, our facility currently enables the detection of the defect as small as 200 nm in size. Our strategy is to reach the defect size as low as possible and at least until 50 nm, which is the size of interest for the EUV lithography. The major developments under consideration in order to lessen the detection limit size are described in details in this paper. Moreover, the roughness of the EUV blanks may be evaluated with our device. This surface parameter has to be optimized, at least for two reasons : to reduce the optical losses and to decrease the number of defects. The mean to quench the roughness signal in order to detect the smallest defect size and the possibility to evaluate the component roughness are combined on the same facility. The major trumps of our experiment are the visualization of the defects in live, the measurement of the defect sizes and the quick evaluation of the laser cleaning efficiency versus various experimental conditions. The cleaning part of the set up is built up to use various powerful laser sources and to shoot, with the laser, only the locations where the defects remain. Finally, this facility allows to evaluate and to optimize our defect free blank process.

Proceedings Article | 3 March 2000 Paper

Laser damage tests and optical densities of laser goggles

Jean Hue, Catherine Pelle, Pierre Garrec, Oliver Lartigue, Francoise Baume, J. Rochas

Proceedings Volume 3902, (2000) https://doi.org/10.1117/12.379320

KEYWORDS: Goggles, Laser damage threshold, Absorbance, Laser induced damage, Calibration, Polarization, Absorption, Mirrors, Photodiodes, Eye

Read Abstract +

Proceedings Article | 3 March 2000 Paper

One-hundred Joule per square centimeter 1.06-um mirrors

Jean DiJon, B. Rafin, Catherine Pelle, Jean Hue, Guillaume Ravel, Bernard Andre

Proceedings Volume 3902, (2000) https://doi.org/10.1117/12.379321

KEYWORDS: Coating, Mirrors, Absorption, Laser damage threshold, Silica, Interfaces, Laser applications, Plasma, Rhodium, Laser development

Read Abstract +

Proceedings Article | 23 July 1999 Paper

Statistical description of laser damage initiation in NIF and LMJ Optics at 355 nm

Michael Feit, Francois Genin, Alexander Rubenchik, Lynn Sheehan, Sheldon Schwartz, Mark Kozlowski, Jean DiJon, Pierre Garrec, Jean Hue

Proceedings Volume 3492, (1999) https://doi.org/10.1117/12.354232

KEYWORDS: National Ignition Facility, Laser induced damage, Laser damage threshold, Silica, Statistical analysis, Glasses, Polishing, Gaussian beams, Raster graphics, Data modeling

Read Abstract +