Mr. Jun Ishikawa Profile
Jun Ishikawa
at Nikon Corp
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Satoshi Ando, Haruki Saito, Sayuri Tanaka, Tetsuya Kawata, Takanobu Okamoto, Katsushi Makino, Yuji Shiba, Takehisa Yahiro, Jun Ishikawa, Masahiro Morita
Proceedings Volume 11611, 116112S (2021) https://doi.org/10.1117/12.2583695
KEYWORDS: Optical alignment, Metrology, Lithography, Calibration, Distortion, Semiconducting wafers, Overlay metrology, Scanners

Proceedings Article | 26 March 2019 Paper
Takehisa Yahiro, Junpei Sawamura, Sonyong Song, Sayuri Tanaka, Yuji Shiba, Satoshi Ando, Hiroyuki Nagayoshi, Jun Ishikawa, Masahiro Morita, Yuichi Shibazaki
Proceedings Volume 10959, 1095908 (2019) https://doi.org/10.1117/12.2514777
KEYWORDS: Optical alignment, Semiconducting wafers, Optical parametric oscillators, Scanners, Distortion, Sensors, Metrology, Wafer testing, Sensing systems, Overlay metrology

Proceedings Article | 13 March 2018 Paper
Takehisa Yahiro, Junpei Sawamura, Tomonori Dosho, Yuji Shiba, Satoshi Ando, Jun Ishikawa, Masahiro Morita, Yuichi Shibazaki
Proceedings Volume 10585, 105852Z (2018) https://doi.org/10.1117/12.2297300
KEYWORDS: Semiconducting wafers, Optical alignment, Optical parametric oscillators, Process control, Overlay metrology, Metrology, Scanners, Distortion, Lithography, Manufacturing

Proceedings Article | 31 March 2014 Paper
Proceedings Volume 9052, 90521F (2014) https://doi.org/10.1117/12.2046238
KEYWORDS: Semiconducting wafers, Reticles, Distortion, Scanners, Wafer-level optics, Control systems, Wavefronts, Data modeling, Overlay metrology, Calibration

Proceedings Article | 13 March 2012 Paper
Yusaku Uehara, Jun Ishikawa, Hirotaka Kohno, Eiichiro Tanaka, Masanori Ohba, Yuichi Shibazaki
Proceedings Volume 8326, 83261H (2012) https://doi.org/10.1117/12.916247
KEYWORDS: Scanners, Semiconducting wafers, Distortion, Optical lithography, Reticles, Computer programming, Double patterning technology, Wavefront aberrations, Immersion lithography, Overlay metrology

Proceedings Article | 23 March 2011 Paper
Jun Ishikawa, Hirotaka Kohno, Shinji Sato, Junichi Kosugi, Yuichi Shibazaki
Proceedings Volume 7973, 79731F (2011) https://doi.org/10.1117/12.879388
KEYWORDS: Semiconducting wafers, Optical alignment, Double patterning technology, Manufacturing, Scanners, Control systems, Immersion lithography, Overlay metrology, Computer programming, Lithography

Proceedings Article | 10 March 2010 Paper
Hirotaka Kohno, Yuichi Shibazaki, Jun Ishikawa, Junichi Kosugi, Yasuhiro Iriuchijima, Masato Hamatani
Proceedings Volume 7640, 76401O (2010) https://doi.org/10.1117/12.846485
KEYWORDS: Semiconducting wafers, Double patterning technology, Optical alignment, Computer programming, Control systems, Eye, Scanners, Overlay metrology, Atrial fibrillation, Interferometers

Proceedings Article | 11 December 2009 Paper
Kazuhiro Hirano, Yuichi Shibazaki, Masato Hamatani, Jun Ishikawa, Yasuhiro Iriuchijima
Proceedings Volume 7520, 75200Z (2009) https://doi.org/10.1117/12.837037
KEYWORDS: Semiconducting wafers, Optical alignment, Double patterning technology, Computer programming, Interferometers, Eye, Calibration, Overlay metrology, Manufacturing, Error analysis

SPIE Journal Paper | 1 January 2009
JM3, Vol. 8, Issue 01, 011003, (January 2009) https://doi.org/10.1117/12.10.1117/1.3023077
KEYWORDS: Double patterning technology, Photomasks, Etching, Reticles, Lithography, Optical lithography, Semiconducting wafers, Image processing, Photoresist processing, Deposition processes

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 714028 (2008) https://doi.org/10.1117/12.804647
KEYWORDS: Double patterning technology, Reticles, Semiconducting wafers, Lithography, Etching, Photomasks, Distortion, Photoresist processing, Interferometers, Logic

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69240R (2008) https://doi.org/10.1117/12.771914
KEYWORDS: Double patterning technology, Photomasks, Etching, Reticles, Semiconducting wafers, Lithography, Image processing, Photoresist processing, Optical lithography, Deposition processes

Proceedings Article | 2 April 2007 Paper
Proceedings Volume 6519, 65190C (2007) https://doi.org/10.1117/12.711853
KEYWORDS: Thin film coatings, Immersion lithography, Semiconducting wafers, Photoresist processing, Silicon, Scanning electron microscopy, Lithography, Image processing, Semiconductors, Data processing

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 65201W (2007) https://doi.org/10.1117/12.712042
KEYWORDS: Semiconducting wafers, Calibration, Particles, Scanners, Immersion lithography, Bridges, Polarization, Lithographic illumination, Scanning electron microscopy, Wavefront aberrations

Proceedings Article | 21 March 2006 Paper
Proceedings Volume 6154, 61541U (2006) https://doi.org/10.1117/12.656349
KEYWORDS: Semiconducting wafers, Calibration, Polarization, Imaging systems, Water, Lithography, Wavefronts, Projection systems, Resonance energy transfer, Scanners

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537214
KEYWORDS: Lithography, Scanners, Distortion, Semiconducting wafers, Systems engineering, Reticles, Projection systems, Wavefront aberrations, Semiconductors, Wavefronts

Showing 5 of 15 publications
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