CONFERENCE PROCEEDINGS
Advanced Search
Kangmin Lee
at SK Hynix Inc
SPIE Involvement:
Author
Publications (3)
Proceedings Article | 27 April 2023 Poster + Paper
ADI to in-cell overlay stability improvement for DRAM using novel scatterometry and comprehensive process control
Proceedings Volume 12496, 124962E (2023) https://doi.org/10.1117/12.2657632
KEYWORDS: Overlay metrology, Semiconducting wafers, Advanced process control, Scanners, Scatterometry, Process control, Signal processing, Metrology, Control systems, Optical parametric oscillators
Proceedings Article | 27 April 2023 Poster + Paper
Effective tool induced shift (eTIS) for determining the total measurement uncertainty (TMU) in overlay metrology
Proceedings Volume 12496, 124963O (2023) https://doi.org/10.1117/12.2670420
KEYWORDS: Semiconducting wafers, Metrology, Calibration, Overlay metrology, Measurement uncertainty, Optical parametric oscillators, Advanced process control, Time metrology, Reproducibility, Optical lithography
Proceedings Article | 27 April 2023 Presentation + Paper
Enhancement of overlay metrology accuracy by multi-wavelength scatterometry with rotated quadrupole illumination
Hyunsok Kim, Ikhyun Jeong, Baikkyu Hong, Sunouk Nam, Sumin Jang, Kangmin Lee, Hongpeng Su, Minho Jeong, Mingyu Kim, Hongcheon Yang, Wayne Zhou, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Hedvi Spielberg, Ohad Bachar, Rawi Dirawi
Proceedings Volume 12496, 1249620 (2023) https://doi.org/10.1117/12.2657678
KEYWORDS: Overlay metrology, Light sources and illumination, Metrology, Signal detection, Scatterometry, Diffraction, Semiconducting wafers, Etching, Tunable lasers, Signal processing
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top