Dr. Koen D'Havé Profile

Dr. Koen D'Havé

at imec

SPIE Involvement:

Author

Publications (26)

Proceedings Article | 28 April 2023 Presentation + Paper

Presentation + Paper

Overview of stitching for high NA: imaging and overlay experimental and simulation results

Natalia Davydova, Lieve van Look, Vincent Wiaux, Joost Bekaert, Frank Timmermans, Eelco van Setten, Bram Slachter, Laura Huddleston, Claire van Lare, Rongkuo Zhao, Dezheng Sun, Ming-Chun Tien, Marcel Beckers, Simon van Gorp, Cees Lambregts, Chung-Tien Li, Arthur van de Nes, Koen D'Havé, Tatiana Kovalevich, Diederik de Bruin, Stephen Hsu, Rene Carpaij

Proceedings Volume 12494, 124940Q (2023) https://doi.org/10.1117/12.2658511

KEYWORDS: Photomasks, Optical proximity correction, Reflection, Critical dimension metrology, Tantalum, Reflectivity, Metrology, Semiconducting wafers, Scanners, Reticles

Read Abstract +

Proceedings Article | 23 March 2020 Presentation + Paper

Presentation + Paper

Novel monitoring of EUV litho cluster for manufacturing insertion

Vincent Truffert, Kit Ausschnitt, Vineet V. Nair, Koen D'Havé

Proceedings Volume 11323, 113230S (2020) https://doi.org/10.1117/12.2551881

KEYWORDS: Extreme ultraviolet, Scanning electron microscopy, Semiconducting wafers, Metrology, Manufacturing, Stochastic processes, Optical lithography, Extreme ultraviolet lithography, Overlay metrology, Line width roughness, Line edge roughness, Optical simulations, Scatterometry

Read Abstract +

Proceedings Article | 8 October 2018 Presentation + Paper

Presentation + Paper

Pattern shift response metrology

Kit Ausschnitt, Vincent Truffert, Koen D'Have, Philippe Leray

Proceedings Volume 10810, 108100T (2018) https://doi.org/10.1117/12.2502353

KEYWORDS: Semiconducting wafers, Metrology, Scanning electron microscopy, Overlay metrology, Photomasks, Critical dimension metrology, Extreme ultraviolet lithography, Etching, Chemical mechanical planarization, Optical lithography

Read Abstract +

Proceedings Article | 12 April 2013 Paper

Paper

Impact of process decisions and alignment strategy on overlay for the 14nm node

David Laidler, Koen D’havé, Philippe Leray, Jan Hermans, Juergen Boemmels, Shaunee Cheng, Huixiong Dai, Yongmei Chen, Bencherki Mebarki, Chris Ngai

Proceedings Volume 8683, 868306 (2013) https://doi.org/10.1117/12.2011968

KEYWORDS: Optical alignment, Etching, Back end of line, Metals, Copper, Double patterning technology, Chemical mechanical planarization, Scanners, Neodymium, Optical lithography

Read Abstract +

Proceedings Article | 12 April 2013 Paper

Paper

Lithography imaging control by enhanced monitoring of light source performance

Paolo Alagna, Omar Zurita, Ivan Lalovic, Nakgeuon Seong, Gregory Rechsteiner, Joshua Thornes, Koen D'havé, Lieve Van Look , Joost Bekaert

Proceedings Volume 8683, 86830S (2013) https://doi.org/10.1117/12.2013213

KEYWORDS: Semiconducting wafers, Lithography, Optical lithography, Metrology, Polarization, Light sources, Critical dimension metrology, Scanners, Control systems, Lithographic illumination

Read Abstract +

Proceedings Article | 5 April 2012 Paper

Paper

High-speed, full 3D feature metrology for litho monitoring, matching, and model calibration with scatterometry

Hugo Cramer, Alek Chen, Fahong Li, Philippe Leray, Anne-Laure Charley, Lieve van Look, Joost Bekaert, Shaunee Cheng

Proceedings Volume 8324, 83240R (2012) https://doi.org/10.1117/12.919050

KEYWORDS: Scatterometry, Scanners, 3D modeling, Optical proximity correction, 3D metrology, Calibration, Metrology, Lithography, Scatter measurement, Scanning electron microscopy

Read Abstract +

Proceedings Article | 14 March 2012 Paper

Paper

Progress in EUV lithography towards manufacturing from an exposure tool perspective

Jan Hermans, David Laidler, Philippe Foubert, Koen D'havé, Shaunee Cheng, Mircea Dusa, Eric Hendrickx

Proceedings Volume 8322, 832202 (2012) https://doi.org/10.1117/12.917616

KEYWORDS: Semiconducting wafers, Reticles, Optical alignment, Scanners, Extreme ultraviolet lithography, Overlay metrology, Critical dimension metrology, Extreme ultraviolet, Silicon, Manufacturing

Read Abstract +

Proceedings Article | 13 March 2012 Paper

Paper

Modeling for field-to-field overlay error

Koen D'havé, Shaunee Cheng

Proceedings Volume 8326, 83260U (2012) https://doi.org/10.1117/12.916345

KEYWORDS: Semiconducting wafers, Scanners, Overlay metrology, Reticles, Data modeling, Calibration, Motion models, Control systems, Optical lithography, Current controlled current source

Read Abstract +

Proceedings Article | 13 March 2012 Paper

Paper

Mix and match overlay optimization strategy for advanced lithography tools (193i and EUV)

David Laidler, Koen D'havé, Jan Hermans, Shaunee Cheng

Proceedings Volume 8326, 83260M (2012) https://doi.org/10.1117/12.916969

KEYWORDS: Scanners, Extreme ultraviolet lithography, Overlay metrology, Extreme ultraviolet, Semiconducting wafers, Reticles, Optical alignment, Lithography, Metrology, Silicon

Read Abstract +

Proceedings Article | 30 September 2011 Paper

Paper

3D features measurement using YieldStar: an angle resolved polarized scatterometer

Anne-Laure Charley, Philippe Leray, Koen D'havé, Shaunee Cheng, Paul Hinnen, Fahong Li, Peter Vanoppen, Mircea Dusa

Proceedings Volume 8169, 81690Q (2011) https://doi.org/10.1117/12.897582

KEYWORDS: 3D metrology, Scatterometry, Critical dimension metrology, Metrology, Lithography, 3D modeling, Optical proximity correction, Diffraction, Calibration, Scatter measurement

Read Abstract +

Proceedings Article | 20 April 2011 Paper

Paper

3D features measurement using YieldStar, an angle resolved polarized scatterometer

Anne-Laure Charley, Philippe Leray, Koen D'havé, Shaunee Cheng, Paul Hinnen, Fahong Li, Peter Vanoppen, Mircea Dusa

Proceedings Volume 7971, 79712E (2011) https://doi.org/10.1117/12.881276

KEYWORDS: 3D metrology, Metrology, Critical dimension metrology, Lithography, Scatterometry, Scanning electron microscopy, Scatter measurement, 3D modeling, Optical proximity correction, Process control

Read Abstract +

Proceedings Article | 20 April 2011 Paper

Paper

Diffraction based overlay re-assessed

Philippe Leray, David Laidler, Koen D'havé, Shaunee Cheng

Proceedings Volume 7971, 797114 (2011) https://doi.org/10.1117/12.882353

KEYWORDS: Overlay metrology, Calibration, Metrology, Semiconducting wafers, Process control, Etching, Silicon, Scanners, Metals, Diffraction

Read Abstract +

Proceedings Article | 23 March 2011 Paper

Paper

Optical proximity stability control of ArF immersion clusters

Lieve Van Look, Joost Bekaert, Koen D'havé, Bart Laenens, Geert Vandenberghe, Shaunee Cheng, Koen Schreel, Jan-Willem Gemmink

Proceedings Volume 7973, 79730R (2011) https://doi.org/10.1117/12.881606

KEYWORDS: Semiconducting wafers, Scanners, Fiber optic illuminators, Critical dimension metrology, Scatterometry, Diffractive optical elements, Scanning electron microscopy, Wafer-level optics, Photomasks, Control systems

Read Abstract +

Proceedings Article | 23 March 2011 Paper

Paper

Scanner matching for standard and freeform illumination shapes using FlexRay

J. Bekaert, L. Van Look, K. D'havé, B. Laenens, G. Vandenberghe, P. van Adrichem, W. Shao, J. Ghan, K. Schreel, J. T. Neumann

Proceedings Volume 7973, 79731I (2011) https://doi.org/10.1117/12.881607

KEYWORDS: Scanners, Fiber optic illuminators, Semiconducting wafers, Photomasks, Reticles, Diffractive optical elements, Cadmium, Critical dimension metrology, Manufacturing, Optical lithography

Read Abstract +

Proceedings Article | 2 April 2010 Paper

Paper

Scatterometry metrology validation with respect to process control

Philippe Leray, Shaunee Cheng, David Laidler, Koen D'havé, Anne-Laure Charley

Proceedings Volume 7638, 76380X (2010) https://doi.org/10.1117/12.848535

KEYWORDS: Scatterometry, Process control, Critical dimension metrology, Lithography, Metrology, Semiconducting wafers, Scanning electron microscopy, Scanners, Scatter measurement, Reflectometry

Read Abstract +

Proceedings Article | 2 April 2010 Paper

Paper

A single metrology tool solution for complete exposure tool setup

David Laidler, Koen D'havé, Anne-Laure Charley, Philippe Leray, Shaunee Cheng, Mircea Dusa, Peter Vanoppen, Paul Hinnen

Proceedings Volume 7638, 763809 (2010) https://doi.org/10.1117/12.848388

KEYWORDS: Semiconducting wafers, Scanners, Overlay metrology, Metrology, Calibration, Control systems, Scatterometry, Process control, Reticles, Diffraction

Read Abstract +

Proceedings Article | 2 April 2010 Paper

Paper

Focus and dose deconvolution technique for improved CD control of immersion clusters

Anne-Laure Charley, Koen D'havé, Philippe Leray, David Laidler, Shaunee Cheng, Mircea Dusa, Paul Hinnen, Peter Vanoppen

Proceedings Volume 7638, 763808 (2010) https://doi.org/10.1117/12.848444

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scanners, Data modeling, Scatterometry, Metrology, Lithography, Finite element methods, Reticles, Scatter measurement

Read Abstract +

Proceedings Article | 24 March 2009 Paper

Paper

Track optimization and control for 32nm node double patterning and beyond

David Laidler, Craig Rosslee, Koen D'havé, Philippe Leray, Len Tedeschi

Proceedings Volume 7272, 727236 (2009) https://doi.org/10.1117/12.814849

KEYWORDS: Etching, Semiconducting wafers, Double patterning technology, Calibration, Metrology, Photoresist processing, Scanners, Polarization, Zone plates, Critical dimension metrology

Read Abstract +

Proceedings Article | 23 March 2009 Paper

Paper

Immersion specific error contribution to overlay control

Koen D'havé, David Laidler, Shaunee Cheng

Proceedings Volume 7272, 72720D (2009) https://doi.org/10.1117/12.814923

KEYWORDS: Semiconducting wafers, Data modeling, Overlay metrology, Scanners, Error analysis, Immersion lithography, Double patterning technology, Motion models, Process modeling, Reticles

Read Abstract +

Proceedings Article | 4 December 2008 Paper

Paper

Cluster optimization to improve CD control as an enabler for double patterning

Len Tedeschi, Craig Rosslee, David Laidler, Philippe Leray, Koen D'havé

Proceedings Volume 7140, 714023 (2008) https://doi.org/10.1117/12.805239

KEYWORDS: Semiconducting wafers, Etching, Critical dimension metrology, Double patterning technology, Error analysis, Scanners, Metrology, Polarization, Photoresist processing, Lithographic illumination

Read Abstract +

Proceedings Article | 24 March 2008 Paper

Paper

Sources of overlay error in double patterning integration schemes

David Laidler, Philippe Leray, Koen D’havé, Shaunee Cheng

Proceedings Volume 6922, 69221E (2008) https://doi.org/10.1117/12.773575

KEYWORDS: Semiconducting wafers, Optical alignment, Overlay metrology, Double patterning technology, Metrology, Etching, Manufacturing, Oxides, Photomasks, Immersion lithography

Read Abstract +

Proceedings Article | 4 April 2007 Paper

Paper

Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner

Koen D'havé, Takahiro Machida, David Laidler, Shaunee Cheng

Proceedings Volume 6518, 651805 (2007) https://doi.org/10.1117/12.714255

KEYWORDS: Semiconducting wafers, Scanners, Monochromatic aberrations, Calibration, Metrology, Optical alignment, Reticles, Wafer testing, Immersion lithography, Overlay metrology

Read Abstract +

Proceedings Article | 20 August 2005 Paper

Paper

A study of near-lossless analog phase modulation in V-shaped switching FLC cells

David Engstrom, Per Rudquist, Jorgen Bengtsson, Koen D'have, Sheila Galt

Proceedings Volume 5936, 593610 (2005) https://doi.org/10.1117/12.617173

KEYWORDS: Polarization, Phase modulation, Switching, Polarizers, Liquid crystals, Phase shift keying, Analog electronics, Modulation, Amplitude modulation, Poincaré sphere

Read Abstract +

Proceedings Article | 10 November 2003 Paper

Paper

Beam steering by combining two binary-phase-modulated FLC SLMs

David Engstrom, Sverker Hard, Per Rudquist, Koen D'have, Tomasz Matuszczyk, Marek Skeren, Bjorn Lofving

Proceedings Volume 5181, (2003) https://doi.org/10.1117/12.502379

KEYWORDS: Spatial light modulators, Beam steering, Diffraction, Sensors, Charge-coupled devices, Diffraction gratings, Modulation, Binary data, Phase modulation, Manufacturing

Read Abstract +

SPIE Journal Paper | 1 October 2001

Novel passive polymer waveguides integrated with electro-optically active ferroelectric liquid crystals

David Hermann, Giusy Scalia, Claire Pitois, F. De Marco, K. D'have, Giancarlo Abbate, Mikael Lindgren, Anders Hult

OE, Vol. 40, Issue 10, (October 2001) https://doi.org/10.1117/12.10.1117/1.1403739

KEYWORDS: Waveguides, Polymers, Polymer multimode waveguides, Prisms, Refractive index, Electro optics, Glasses, Photorefractive polymers, Polymer thin films, Ferroelectric LCDs

Proceedings Article | 17 March 2000 Paper

Paper

Antiferroelectric liquid crystals with 45(0) tilt: new electro-optic effects in liquid crystals

K. D'have, Per Rudquist, M. Matuszczyk, Sven Lagerwall, Herman Pauwels, Roman Dabrowski

Proceedings Volume 3955, (2000) https://doi.org/10.1117/12.379981

KEYWORDS: Liquid crystals, Polarization, Polarizers, Electro optics, Phase shift keying, Glasses, Modulation, LCDs, Switching, Scattering

Read Abstract +

Showing 5 of 26 publications

SIGN IN TO:

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Advertisement

Advertisement