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Nobuo Miyamoto
at NuFlare Technology Inc
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Publications (3)
Proceedings Article | 25 October 2016 Paper
Electron beam mask writer EBM-9500 for logic 7nm node generation
Hideki Matsui, Takashi Kamikubo, Satoshi Nakahashi, Haruyuki Nomura, Noriaki Nakayamada, Mizuna Suganuma, Yasuo Kato, Jun Yashima, Victor Katsap, Kenichi Saito, Ryoei Kobayashi, Nobuo Miyamoto, Munehiro Ogasawara
Proceedings Volume 9985, 998508 (2016) https://doi.org/10.1117/12.2242987
KEYWORDS: Photomasks, Lithography, Electron beams, Logic, Electron beam melting, Line edge roughness, Electron beam lithography, Extreme ultraviolet, Optical lithography, LCDs
Proceedings Article | 9 September 2013 Paper
Turret-type electron gun for EBM-8000
Nobuo Miyamoto, Rodney Kendall, Kenichi Saito
Proceedings Volume 8880, 88801G (2013) https://doi.org/10.1117/12.2027456
KEYWORDS: Electron beams, Photomasks, Power supplies, Electrodes, Protactinium, Temperature metrology, Manufacturing, Semiconductors, Photomask technology, Current controlled current source
Proceedings Article | 11 May 2007 Paper
Electron-beam mask writer EBM-6000 for 45-nm HP node
Jun Yashima, Kenji Ohtoshi, Noriaki Nakayamada, Hirohito Anze, Takehiko Katsumata, Tomohiro Iijima, Rieko Nishimura, Syuuichiro Fukutome, Nobuo Miyamoto, Seiji Wake, Yusuke Sakai, Shinji Sakamoto, Shigehiro Hara, Hitoshi Higurashi, Kiyoshi Hattori, Kenichi Saito, Rodney Kendall, Shuichi Tamamushi
Proceedings Volume 6607, 660703 (2007) https://doi.org/10.1117/12.728917
KEYWORDS: Line edge roughness, Photomasks, Control systems, Standards development, Manufacturing, Monochromatic aberrations, Electron beam melting, Photoresist processing, Beam shaping, Electron beams
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