Dr. Taejoong Kim Profile

Dr. Taejoong Kim

at SAMSUNG Electronics Co. Ltd.

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Author

Publications (7)

Proceedings Article | 15 August 2023 Presentation + Paper

Improving the accuracy and precision of OCD measurement by systematic error correction in self-interference pupil ellipsometry

Seungwoo Lee, Yeeun Park, Seungryeol Lee, Hoonchul Chang, Jaehwang Jung, Inho Shin, Seoyeon Jeong, Sooyeong Lee, Jinwoo Ahn, Taejoong Kim, Taeyong Jo, Myungjun Lee

Proceedings Volume 12618, 126180B (2023) https://doi.org/10.1117/12.2677195

KEYWORDS: Objectives, Beam splitters, Polarization, Temperature metrology, Ellipsometry, Error analysis, Optical components

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Proceedings Article | 27 April 2023 Paper

Wide-field massive CD metrology based on the imaging Mueller-matrix ellipsometry for semiconductor devices

Juntaek Oh, Jaehyeon Son, Eunsoo Hwang, Jinwoo Ahn, Jaewon Lee, Byungkwan Oh, Donggun Lee, Seunga Lim, Kihun Kang, Sangil Im, Jibin Jeong, Taehyun Yun, Jinsoo Lee, Changhyeong Yoon, Hyukjoon Cho, Gangbu Kim, Byeongki Kang, Hankyoul Moon, Jong-hyun Hwang, Youngkyu Park, Taejoong Kim, Suyoung Lee, Yusin Yang, Myungjun Lee

Proceedings Volume 12496, 124962X (2023) https://doi.org/10.1117/12.2658131

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Metrology, Semiconductors, Mueller matrices, Ellipsometry, Inspection

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Proceedings Article | 27 April 2023 Presentation + Paper

Mueller matrix metrology with multi-angle information using multiple self-interference

Garam Choi, Jinyong Kim, Daehoon Han, Young-Uk Jin, Soonhong Hwang, Jinseob Kim, Wookrae Kim, Jaehwang Jung, Seungwoo Lee, Taejoong Kim, Jinwoo Ahn, Myungjun Lee, Gideok Kim, Su-Young Lee, Yusin Yang

Proceedings Volume 12496, 1249610 (2023) https://doi.org/10.1117/12.2657852

KEYWORDS: Mueller matrices, Line edge roughness, Polarization, Metrology, Simulations, Critical dimension metrology, Holograms, Ellipsometry, Holography

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Proceedings Article | 27 April 2023 Presentation + Paper

Massive overlay metrology solution by realizing imaging Mueller matrix spectroscopic ellipsometry

Jaehyeon Son, Juntaek Oh, Eunsoo Hwang, Jinwoo Ahn, Jaewon Lee, Byungkwan Oh, Donggun Lee, Seunga Lim, Kihun Kang, Sangil Im, Jibin Jeong, Taehyun Yun, Jinsoo Lee, Changhyeong Yoon, Hyukjoon Cho, Gangbu Kim, Byeongki Kang, Hankyoul Moon, Jong-hyun Hwang, Youngkyu Park, Taejoong Kim, Suyoung Lee, Yusin Yang, Myungjun Lee

Proceedings Volume 12496, 124960L (2023) https://doi.org/10.1117/12.2657414

KEYWORDS: Overlay metrology, Mueller matrices, Semiconducting wafers, Spectroscopic ellipsometry, Critical dimension metrology, Imaging spectroscopy, Metrology, Polarization, Polysomnography, Image sensors

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Proceedings Article | 17 March 2021 Presentation + Paper

Machine learning aided process control: critical dimension uniformity control of etching process in 1z nm DRAM

Taeyong Jo, Insoo Choi, Doocheol Choi, Yoonsung Bae, Seunggun Byoun, Inho Kim, Sukwon Lee, Changhoon Choi, Euiseok Kum, Youngil Kang, Taejoong Kim, Youngjoo Lee

Proceedings Volume 11611, 116111L (2021) https://doi.org/10.1117/12.2583473

KEYWORDS: Process control, Etching, Machine learning, Semiconductors, Cadmium, Temperature metrology, Semiconducting wafers, Neural networks, Metrology, Artificial neural networks

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Proceedings Article | 22 February 2021 Presentation + Paper

High-speed wafer film measurement with heterogeneous optical sensor system

Doo-Hyun Cho, Seung Beom Park, Sung-Ha Kim, Taejoong Kim, Kwangsung Lee

Proceedings Volume 11611, 116110H (2021) https://doi.org/10.1117/12.2584200

KEYWORDS: RGB color model, Semiconducting wafers, Data modeling, Optical sensors, Optical testing, Hyperspectral imaging, Sensor fusion, Principal component analysis, Metrology, Instrument modeling

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Proceedings Article | 21 August 2020 Presentation + Paper

Vision-based high speed wafer film thickness profile estimation with nonlinear regression

Doo-Hyun Cho, Hyounggon Kim, Jaehyeon Son, Sung-Ha Kim, Taejoong Kim, Kwangsung Lee

Proceedings Volume 11500, 115000K (2020) https://doi.org/10.1117/12.2566426

KEYWORDS: Data modeling, Semiconducting wafers, Metrology, Image processing, General packet radio service, Visual process modeling, Sensors, Chemical mechanical planarization, RGB color model

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Showing 5 of 7 publications

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