Yoichi Matsuoka
at Canon Inc.
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 23 August 2021 Paper
Proceedings Volume 11908, 119080E (2021) https://doi.org/10.1117/12.2600797

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11610, 1161007 (2021) https://doi.org/10.1117/12.2584720
KEYWORDS: Nanoimprint lithography, Manufacturing, Computational lithography, Semiconductors, Semiconductor manufacturing, Optical lithography, Semiconducting wafers, Photomasks, Ultraviolet radiation, Physics

Proceedings Article | 12 June 2018 Paper
Tsuyoshi Arai, Yoichi Matsuoka, Hisanobu Azuma
Proceedings Volume 10807, 1080704 (2018) https://doi.org/10.1117/12.2500482
KEYWORDS: Particles, Photomasks, Semiconducting wafers, Nanoimprint lithography, Mask cleaning, Control systems, Semiconductor manufacturing, Liquids, Solids, Photoresist processing

Proceedings Article | 13 July 2017 Paper
Masami Yonekawa, Takahiro Nakayama, Kazuki Nakagawa, Toshihiro Maeda, Yoichi Matsuoka, Keiji Emoto, Hisanobu Azuma, Yukio Takabayashi, Ali Aghili, Makoto Mizuno, Jin Choi, Chris Jones
Proceedings Volume 10454, 104540R (2017) https://doi.org/10.1117/12.2279365
KEYWORDS: Semiconducting wafers, Curtains, Polishing, Lithography, Liquids, Ceramics, Nanoimprint lithography, Particles, Control systems, Semiconductor manufacturing, Photomasks

Proceedings Article | 21 March 2017 Paper
Takahiro Nakayama, Masami Yonekawa, Yoichi Matsuoka, Hisanobu Azuma, Yukio Takabayashi, Ali Aghili, Makoto Mizuno, Jin Choi, Chris Jones
Proceedings Volume 10144, 1014407 (2017) https://doi.org/10.1117/12.2257647
KEYWORDS: Photomasks, Particles, Nanoimprint lithography, Lithography, Semiconductors, Control systems, Semiconductor manufacturing, Ultraviolet radiation, Optical lithography, Semiconducting wafers, Curtains, Ceramics, Surface finishing, Polishing

Showing 5 of 9 publications
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