Fabrication of gate electrodes for scalable quantum computing using CMOS industry compatible e-beam lithography and numerical simulation of the resulting quantum device

Varvara Brackmann; Malte Neul; Michael Friedrich; Wolfram Langheinrich; Maik Simon; Pascal Muster; Sebastian Pregl; Arne Demmler; Norbert Hanisch; Maximilian Lederer; Katrin Zimmermann; Jan Klos; Felix Reichmann; Yuji Yamamoto; Marcus Wislicenus; Claus Dahl; Lars R. Schreiber; Hendrik Bluhm; Benjamin Lilienthal-Uhlig

doi:10.1117/12.2675943

5 October 2023 Fabrication of gate electrodes for scalable quantum computing using CMOS industry compatible e-beam lithography and numerical simulation of the resulting quantum device

Varvara Brackmann, Malte Neul, Michael Friedrich, Wolfram Langheinrich, Maik Simon, Pascal Muster, Sebastian Pregl, Arne Demmler, Norbert Hanisch, Maximilian Lederer, Katrin Zimmermann, Jan Klos, Felix Reichmann, Yuji Yamamoto, Marcus Wislicenus, Claus Dahl, Lars R. Schreiber, Hendrik Bluhm, Benjamin Lilienthal-Uhlig

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Proceedings Volume 12802, 38th European Mask and Lithography Conference (EMLC 2023); 128020F (2023) https://doi.org/10.1117/12.2675943
Event: 38th European Mask and Lithography Conference, 2023, Dresden, Germany

Abstract

Universal quantum computers promise the possibility of solving certain computational problems significantly faster than classically possible. For relevant problems, millions of qubits are needed, which is only feasible with industrial production methods. This study presents an electron beam patterning process of gate electrodes for Si/SiGe electron spin qubits, which is compatible with modern CMOS semiconductor manufacturing. Using a pCAR e-beam resist, a process window is determined in which structure sizes of 50 nm line and 30 nm space can be reproducibly fabricated with reasonable throughput. Based on electrostatic simulations, we implemented a feedback loop to investigate the functionality of the gate electrode geometry under fabrication-induced variations.

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Varvara Brackmann, Malte Neul, Michael Friedrich, Wolfram Langheinrich, Maik Simon, Pascal Muster, Sebastian Pregl, Arne Demmler, Norbert Hanisch, Maximilian Lederer, Katrin Zimmermann, Jan Klos, Felix Reichmann, Yuji Yamamoto, Marcus Wislicenus, Claus Dahl, Lars R. Schreiber, Hendrik Bluhm, and Benjamin Lilienthal-Uhlig "Fabrication of gate electrodes for scalable quantum computing using CMOS industry compatible e-beam lithography and numerical simulation of the resulting quantum device", Proc. SPIE 12802, 38th European Mask and Lithography Conference (EMLC 2023), 128020F (5 October 2023); https://doi.org/10.1117/12.2675943

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KEYWORDS

Quantum gates

Electrodes

Quantum communications

Electron beam lithography

Etching

Quantum processes

Fabrication

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