Editorial
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 010101, (March 2024) https://doi.org/10.1117/1.JMM.23.1.010101
Open Access
TOPICS: Lithography, Semiconductors, Optical lithography, Vacuum, Engineering, Physics, Plasma etching, Photomasks, Photomask technology, Photoemission spectroscopy
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 010102, (January 2024) https://doi.org/10.1117/1.JMM.23.1.010102
Open Access
TOPICS: Metrology
Special Section on Patterning for Advanced Packaging
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 011001, (February 2024) https://doi.org/10.1117/1.JMM.23.1.011001
Open Access
TOPICS: Advanced packaging, Optical lithography, Front end of line, Packaging, Reliability, Electronic design automation, Chip manufacturing, Yield improvement, Semiconductors, Photoresist processing
Hiromi Suda, Douglas Shelton, Ken-Ichiro Mori, Ken-Ichiro Shinoda, Yoshio Goto, Kosuke Urushihara
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 011002, (January 2024) https://doi.org/10.1117/1.JMM.23.1.011002
TOPICS: Packaging, Optical lithography, Overlay metrology, Lithography, Semiconducting wafers, Photoresist materials, Manufacturing, Critical dimension metrology, Coating, Glasses
Jaime Bravo, Philippe Morey-Chaisemartin, Eric Beisser, Frederic Brault, Joshua Zusman, Jimmy Lefevre, Lifu Chang
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 011003, (January 2024) https://doi.org/10.1117/1.JMM.23.1.011003
TOPICS: Semiconducting wafers, Silicon, Electronic design automation, Reliability, Polymers, Image processing, Wafer bonding, Photomasks, Semiconductors, Packaging
Ken-ichiro Shinoda, Douglas Shelton, Masaki Mizutani, Ken-Ichiro Mori, Hiromi Suda
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 011004, (January 2024) https://doi.org/10.1117/1.JMM.23.1.011004
TOPICS: Distortion, Silicon, Overlay metrology, Artificial intelligence, Optical lithography, Light sources and illumination, Critical dimension metrology, Aspheric lenses, Advanced packaging, Submicron lithography
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 011005, (February 2024) https://doi.org/10.1117/1.JMM.23.1.011005
TOPICS: Lithography, Copper, Overlay metrology, Optical alignment, Optical lithography, Thermal deformation, Deformation, Film thickness, Etching, Miniaturization
Special Section on Curvilinear Masks, Part 1
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 011202, (November 2023) https://doi.org/10.1117/1.JMM.23.1.011202
TOPICS: Semiconducting wafers, Information theory, Extreme ultraviolet, Simulations, Industry, Image resolution, Chip manufacturing, Semiconductors, Lithography, Reticles
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 011203, (November 2023) https://doi.org/10.1117/1.JMM.23.1.011203
TOPICS: Optical proximity correction, Shrinkage, Shape analysis, Visualization, Optical lithography, Nonlinear control, Manufacturing, Lithography, Industry, Histograms
Jiuning Hu, Adam Lyons, Chris Spence, Kurt Wampler, Mahmoud Mohsen, Yen-Wen Lu, Rachit Gupta, Youping Zhang, Rafael Howell, Jiyoon Chang, James Moon, Jun Ye
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 011204, (January 2024) https://doi.org/10.1117/1.JMM.23.1.011204
TOPICS: Microchannel plates, Optical proximity correction, Lithography, Extreme ultraviolet, Deep ultraviolet, Solids, SRAF, Metals, Photovoltaics, Data storage
Mathias Tomandl, Christoph Spengler, Peter Hudek, Christof Klein, Hans Loeschner, Elmar Platzgummer
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 011205, (February 2024) https://doi.org/10.1117/1.JMM.23.1.011205
Open Access
TOPICS: Extreme ultraviolet, Distortion, Lenses, Nanofabrication, Industry, Magnetism, Industrial applications, Lithography, Extreme ultraviolet lithography, Projection systems
Noriaki Nakayamada, Haruyuki Nomura, Yasuo Kato, Kenichi Yasui, Abhishek Shendre, Nagesh Shirali, Yukihiro Masuda, Aki Fujimura
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 011206, (February 2024) https://doi.org/10.1117/1.JMM.23.1.011206
TOPICS: Design, Etching, Vestigial sideband modulation, Printing, Dose control, Raster graphics, Bias correction, Lithography, Electron beam lithography, Scanning electron microscopy
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 011207, (February 2024) https://doi.org/10.1117/1.JMM.23.1.011207
TOPICS: Vestigial sideband modulation, Semiconducting wafers, Optical proximity correction, SRAF, Critical dimension metrology, Lithography, Printing, Design, Scanning electron microscopy, Photomask technology
Alternative lithographic technologies
Ayşe Aygül Ergürhan, Onur Şenel, Elif Yılmaz, Burcu Arpapay, Mustafa Kulakcı, Uğur Serincan
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 013001, (February 2024) https://doi.org/10.1117/1.JMM.23.1.013001
TOPICS: Sampling rates, Scanning electron microscopy, Statistical analysis, Polystyrene, Picosecond phenomena, Monolayers, Lithography, Visualization, Image visualization, Bioalcohols
Computational lithography and resolution enhancement techniques
Hui Xu, Pan Qi, Fuxin Tang, Ruijun Ma, Huaguo Liang, Zhengfeng Huang, Xiaoqing Wen
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 013201, (January 2024) https://doi.org/10.1117/1.JMM.23.1.013201
TOPICS: Transformers, Source mask optimization, Semiconducting wafers, Lithography, Optical proximity correction, Feature extraction, Printing, Education and training, Windows, Image processing
Hui Xu, Ye Yuan, Ruijun Ma, Pan Qi, Fuxin Tang, Xinzhong Xiao, Wenxin Huang, Huaguo Liang
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 013202, (February 2024) https://doi.org/10.1117/1.JMM.23.1.013202
TOPICS: Lithography, Education and training, Convolution, Feature fusion, Feature extraction, Machine learning, Performance modeling, Deep learning, Convolutional neural networks, Statistical modeling
Metrology
Boglárka Dikó, Roberta Zsófia Kiss, Dávid Egri, Emeric Balogh
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 014001, (February 2024) https://doi.org/10.1117/1.JMM.23.1.014001
Open Access
TOPICS: Picosecond phenomena, Field effect transistors, Matrices, Critical dimension metrology, Reflection, Mueller matrices, Transistors, Correlation coefficients, Tunable filters, Polarization
Timothée Choisnet, Abdelali Hammouti, Vincent Gagneur, Jérôme Reche, Guido Rademaker, Guillaume Freychet, Guillaume Jullien, Julien Ducoté, Patrice Gergaud, Delphine Le Cunff
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 014002, (March 2024) https://doi.org/10.1117/1.JMM.23.1.014002
TOPICS: Critical dimension metrology, Transmission electron microscopy, Cadmium, X-rays, Synchrotrons, Silicon, Semiconducting wafers, Lithography, Scanning electron microscopy, Chromium
Machine learning and deep learning
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 014201, (January 2024) https://doi.org/10.1117/1.JMM.23.1.014201
Open Access
TOPICS: 3D modeling, 3D mask effects, Diffraction, Extreme ultraviolet lithography, Light sources and illumination, Waveguides, Waveguide modes, Wave equations, Extreme ultraviolet, Fourier transforms
Photoresists and other lithographic materials
Jesse Grayson, Marisol Valdez, Weijie Xu, Julia W. Hsu
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 014601, (January 2024) https://doi.org/10.1117/1.JMM.23.1.014601
Open Access
TOPICS: Indium, Extreme ultraviolet, Humidity, Extreme ultraviolet lithography, Crystals, Switches, Solubility, Metals, Optical microscopes, Film thickness
Oleg Kostko, Terry McAfee, Jonathan Ma, James Blackwell, Patrick Naulleau
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 014602, (March 2024) https://doi.org/10.1117/1.JMM.23.1.014602
TOPICS: Electrons, Extreme ultraviolet, Polymers, Photons, Extreme ultraviolet lithography, Absorption, Signal attenuation, Photoemission spectroscopy, Film thickness, Signal intensity
Process control
Jungchul Song, Gyu-Won Han, Jeonghwan Kim, Gawon Lee
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 014801, (February 2024) https://doi.org/10.1117/1.JMM.23.1.014801
TOPICS: Critical dimension metrology, Double patterning technology, Optical lithography, Semiconducting wafers, Line width roughness, Scanners, Photoacid generators, Etching, Light sources, Diffractive optical elements
Process integration and fabrication
Michael Richter, Thomas Beckenbach, Constantin Rauch, Stephan Schreiner, Marcus Zuber, Elias Hamann, Arndt Last, Martin Börner, Jan Korvink, Pascal Meyer
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 01, 014901, (February 2024) https://doi.org/10.1117/1.JMM.23.1.014901
Open Access
TOPICS: Bridges, X-rays, Gold, Scanning electron microscopy, Metals, Electroplating, Nickel, Photoresist processing, Fabrication, Optical gratings
Back to Top